Display device

ABSTRACT

A display device includes: a substrate including a first pixel area, a second pixel area having a smaller area than the first pixel area and connected to the first pixel area, and a peripheral area surrounding the first pixel area and the second pixel area; a first pixel provided in the first pixel area and a second pixel provided in the second pixel area; a first line connected to the first pixel and a second line connected to the second pixel; a dummy part disposed in the peripheral area, overlapping at least one of the first line and the second line and providing a parasitic capacitance that compensates for a difference in a load value between the first line and the second line; and a power supply line provided in the first and second pixel areas. The dummy part includes an insulating layer having at least one contact hole.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation application of U.S. patentapplication Ser. No. 16/557,977 filed on Aug. 30, 2019, which is acontinuation application of U.S. patent application Ser. No. 15/709,196filed on Sep. 19, 2017, now issued to U.S. Pat. No. 10,403,193, whichclaims priority to, and the benefit of, Korean Patent Application No.10-2016-0121559 filed on Sep. 22, 2016 in the Korean IntellectualProperty Office, the disclosures of which are incorporated herein byreference in their entirety.

BACKGROUND 1. Field

The present disclosure relates to a display device.

2. Description of the Related Art

A display device may include a plurality of pixels, and each of thepixels includes a display element. Each of the pixels may furtherinclude lines and a plurality of transistors that are connected to thelines and drive the display element.

The lines that are connected to the pixels may have varying load valuesdepending on their lengths. The size of a pixel area where the pixelsare disposed may vary depending on the position thereof due to a processmargin. A brightness difference caused by the difference in the loadvalues between the lines and a difference in size of the pixel area mayoccur in an image displayed on the display device.

SUMMARY

Embodiments of the present disclosure provide a display device havinguniform brightness.

Embodiments of the present disclosure provide a display device,including a substrate including a first pixel area, a second pixel areahaving a smaller area than the first pixel area and connected to thefirst pixel area, and a peripheral area surrounding the first pixel areaand the second pixel area, a first pixel provided in the first pixelarea and a second pixel provided in the second pixel area, a first lineconnected to the first pixel and a second line connected to the secondpixel, a dummy part disposed in the peripheral area, overlapping with atleast one of the first line and the second line, and providing aparasitic capacitance that compensates for a difference in a load valuebetween the first line and the second line; and a power supply lineprovided in the first pixel area and the second pixel area, wherein thedummy part includes an insulating layer having at least one contacthole.

The dummy part may include an active pattern provided on the substrate;and a first metal layer provided on the insulating layer, wherein theinsulating layer is provided on the active pattern and a portion of theactive pattern is exposed through the at least one contact hole, andwherein the active pattern and the first metal layer are connectedthrough the contact hole.

The contact hole may be provided in an overlapping area between theactive pattern and the first metal layer.

The first metal layer may be connected to the power supply line.

A fixed voltage may be applied to the power supply line and the dummypart.

The peripheral area may include a first peripheral area in a vicinity ofthe first pixel area; a second peripheral area in a vicinity of thesecond pixel area; and an additional peripheral area adjacent to thefirst pixel area and the second peripheral area.

The dummy part may be disposed in the second peripheral area.

The dummy part may further include a second metal layer disposed betweenthe active pattern and the first metal layer.

The insulating layer may further include a dummy contact hole.

A density of elements disposed in the dummy part may be similar to adensity of elements disposed in the second pixel that is disposedclosest to the dummy part in the second pixel area.

The dummy part may include at least two sub-dummy parts separated fromeach other in a distance.

The at least two sub-dummy parts may be connected to each other by acoupling pattern.

The coupling pattern may be provided between the second metal layer andthe first metal layer.

The display device may further include a passivation layer provided onthe first metal layer, a pixel defining layer provided on thepassivation layer, and a sealing layer covering portions of the firstpixel area, the second pixel area, and the peripheral area and includingan inorganic material.

The passivation layer and the pixel defining layer may include a valleyformed by removing portions of the passivation layer and the pixeldefining layer along circumferences of the first pixel area and thesecond pixel area.

The valley may be formed at a position corresponding to the couplingpattern.

The sealing layer may cover side surfaces of the passivation layer andthe pixel defining layer.

The first line may be a first scan line extending in a first directionon the substrate and supplying a scan signal to the first pixel, and thesecond line may be a second scan line extending in the first directionand supplying a scan signal to the second pixel.

A length of the first scan line may be greater than a length of thesecond scan line.

The second scan line may extend to the second peripheral area andoverlaps with the dummy part.

The second scan line extending to the second peripheral area may beformed integrally with the second metal layer.

The display device may further include a first emission control lineconnected to the first pixel and a second emission control lineconnected to the second pixel.

The second emission control line may extend to the second peripheralarea and overlaps with the dummy part.

The display device may further include a data line extending in a seconddirection that crosses the first direction on the substrate, wherein thedata line is separated from the power supply line.

The second pixel may include a transistor connected to the second scanline and the data line, and wherein the transistor includes: the activepattern provided on the substrate, a gate electrode provided on theactive pattern with a gate insulating layer interposed therebetween, aninterlayer insulating layer including a first interlayer insulatinglayer covering the gate electrode and a second interlayer insulatinglayer disposed on the first interlayer insulating layer, and a sourceelectrode and a drain electrode disposed on the interlayer insulatinglayer and connected to the active pattern.

The substrate may further include a third area separated from the secondpixel area and connected to the first pixel area and a third peripheralarea surrounding the third pixel area.

The dummy part may be disposed in the third peripheral area.

The display device may further include a third pixel provided in thethird pixel area, and a third scan line supplying a scan signal to thethird pixel, wherein the third scan line extends to the third peripheralarea and overlaps with the dummy part.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1 and 2 are plan views illustrating a display device, according tovarious embodiments.

FIG. 3 is a block diagram illustrating an embodiment of pixels and adriver of a display device shown in FIG. 1.

FIG. 4 is a circuit diagram of an embodiment of a first pixel shown inFIG. 3.

FIG. 5 is a detailed plan view illustrating a first pixel shown in FIG.4.

FIG. 6 is a cross-sectional view taken along line I-I′ of FIG. 5.

FIG. 7 is a cross-sectional view taken along line II-II′ of FIG. 5.

FIG. 8 is a plan view illustrating a portion corresponding to P1 of FIG.1.

FIG. 9 is a cross-sectional view taken along line III-III′ of FIG. 8.

FIGS. 10 to 13 are schematic layout views illustrating layers ofelements of a second pixel and a dummy part shown in FIG. 8.

FIG. 14 is a plan view illustrating a portion corresponding to P1 ofFIG. 1 for illustrating portions of a dummy part according to anotherembodiment and a portion of a second pixel area adjacent to the dummypart.

FIGS. 15 and 16 are plan views illustrating a display device, accordingto another embodiment.

FIG. 17 is a plan view illustrating a portion corresponding to P2 ofFIG. 15.

FIG. 18 is a cross-sectional view taken along line IV-IV′ of FIG. 17.

DETAILED DESCRIPTION

Various modifications and changes may be applied to the examples ofembodiments in accordance with the present disclosure so that theexamples of embodiments will be illustrated in the drawings anddescribed in the specification. However, the examples of embodimentsaccording to the present disclosure are not limited to the specificembodiments, but include all changes, equivalents, or alternatives thatare included in the spirit and technical scope of the presentdisclosure.

Like reference numerals are used for referring to the same or similarelements in the description and drawings. In the attached drawings, thedimensions of the components exaggerated for clarity of illustration.Terminologies such as first or second may be used to describe variouscomponents but the components are not limited by the aboveterminologies. The above terminologies are used to distinguish onecomponent from the other component, for example, a first component maybe referred to as a second component without departing from a scope inaccordance with the present disclosure and similarly, a second componentmay be referred to as a first component. The terms of a singular formmay include plural forms unless referred to the contrary.

In the present disclosure, it will be appreciated that terms “including”and “having” are intended to designate the existence of characteristics,numbers, steps, operations, constituent elements, and componentsdescribed in the specification or a combination thereof, and do notexclude a possibility of the existence or addition of one or more otherspecific characteristics, numbers, steps, operations, constituentelements, and components, or a combination thereof in advance. It willbe understood that when an element such as a layer, film, area, orsubstrate is referred to as being “on” another element, it can bedirectly on the other element or intervening elements may also bepresent. On the contrary, it will be understood that when an elementsuch as a layer, film, area, or substrate is referred to as being“beneath” another element, it can be directly beneath the other elementor intervening elements may also be present.

A display device according to exemplary embodiments of the presentdisclosure will now be described more fully with reference to theaccompanying drawings.

FIGS. 1 and 2 are plan views illustrating a display device, according tovarious embodiments.

The display device may include a substrate SUB, a plurality of pixels(PXL1, PXL2, and PXL3; hereinafter, ‘PXL’) provided on the substrateSUB, a driver provided on the substrate SUB and driving the pixels PXL,a power supply unit supplying power to the pixels PXL, and a line partconnecting the pixels PXL and the driver to each other.

The substrate SUB may include a plurality of areas, at least two ofwhich may include different sizes. According to one embodiment, thesubstrate SUB may have three areas. These three areas may have differentsizes from each other, or two of the three areas may have differentsizes. According to another embodiment, the substrate SUB may have fouror more areas.

For convenience of explanation, the substrate SUB having three areas,i.e., first, second, and third areas A1, A2, and A3 is described belowas an example.

Each of the first, second, and third areas A1, A2, and A3 may havevarious shapes. For example, each of the first, second, and third areasA1, A2, and A3 may have various shapes, such as a polygon having aclosed shape including straight sides, a circle or an oval includingcurved sides, or a semi-circle or a semi-oval including straight andcurved sides.

Referring to FIG. 1, each of the first, second, and third areas A1, A2,and A3 may have a substantially rectangular shape. Referring to FIG. 2,at least a corner portion each of the first, second, and third areas A1,A2, and A3 may have a width decreasing away from the boundaries betweenthe second and third areas A2 and A3 and the first area A1. For example,an outer corner of the second and third areas A2 and A3 may be cut tohave an oblique corner.

The first, second, and third areas A1, A2, and A3 may include the pixelareas (PXA1, PXA2, and PXA3; hereinafter, ‘PXA’) and peripheral areas(PPA1, PPA2, and PPA3; hereinafter, ‘PPA’). The pixel areas PXA mayrefer to an area where the pixels PXL displaying an image are provided.The pixels PXL are described below.

According to one embodiment, the first, second, and third pixel areasPXA1, PXA2, and PXA3 may have substantially corresponding shapes to thefirst, second, and to third areas A1, A2, and A3, respectively.

The peripheral areas PPA may refer to an area where the pixels PXL arenot provided, i.e., where an image is not displayed. The driverconfigured to drive the pixels PXL, the power supply unit configured toapply power to the pixels PXL, and some of lines (not illustrated)connecting the pixels PXL to the driver may be provided in theperipheral areas PPA. The peripheral areas PPA may correspond to a bezelof the display device, and a width of the bezel may be determined by awidth of the peripheral areas PPA.

The first, second, and third areas A1, A2, and A3 are described below.

The first area A1, among the first, second, and third areas A1, A2, andA3, may have the largest area. The first area A1 may include the firstpixel area PXA1 where an image is displayed and the first peripheralarea PPA1 surrounding at least a portion of the first pixel area PXA1.

The first pixel area PXA1 may be provided to have a shape correspondingto the first area A1. According to one embodiment, the first pixel areaPXA1 may have a first width W1 in a first direction DR1 and a firstlength L1 in a second direction DR2 that crosses the first directionDR1.

The first peripheral area PPA1 may be provided on at least one side ofthe first pixel area PXA1. According to one embodiment, the firstperipheral area PPA1 may surround the circumference of the first pixelarea PXA1 and be provided at any position except for positions where thesecond area A2 and the third area A3 are arranged. According to oneembodiment, the first peripheral area PPA1 may include a horizontalportion extending in the first direction DR1 and vertical portionsextending in the second direction DR2. The vertical portions of thefirst peripheral area PPA1 may be provided as a pair and separated fromeach other in the first direction DR1 by the first pixel area PXA1.

The second area A2 may have a smaller area than the first area A1. Thesecond area A2 may include the second pixel area PXA2 where an image isdisplayed, and a second peripheral area PPA2 surrounding at least aportion of the second pixel area PXA2.

The second pixel area PXA2 may be provided to have a shape correspondingto the second area A2. According to one embodiment, the second pixelarea PXA2 may have a second width W2 that is shorter than the firstwidth W1 of the first pixel area PXA1. The second pixel area PXA2 mayhave a second length L2 that is shorter than the first length L1 of thefirst area A1. The second pixel area PXA2 may extend from the firstpixel area PXA1 and be directly connected to the first pixel area PXA1.For example, one side of the second pixel area PXA2 may contact one sideof the first pixel area PXA1.

The second peripheral area PPA2 may be provided on at least one side ofthe second pixel area PXA2. According to one embodiment, the secondperipheral area PPA2 may surround the second pixel area PXA2 exceptportions where the first pixel area PXA1 and the second pixel area PXA2are connected to each other. According to one embodiment, the secondperipheral area PPA2 may include a horizontal portion extending in thefirst direction DR1 and vertical portions extending in the seconddirection DR2. The vertical portions of the second peripheral area PPA2may be provided as a pair and separated from each other in the firstdirection DR1 by the second pixel area PXA2.

The third area A3 may have a smaller size than the first area A1. Forexample, the third area A3 may have substantially the same size as thesecond area A2. The third area A3 may include a third pixel area PXA3where an image is displayed and a third peripheral area PPA3 surroundingat least a portion of the third pixel area PXA3.

The third pixel area PXA3 may have a corresponding shape to the thirdarea A3. According to one embodiment, the third pixel area PXA3 may havea third width W3 that is shorter than the first width W1 of the firstarea A1. The third pixel area PXA3 may have a third length L3 that isshorter than the first length L1 of the first area A1. The second widthW2 and the third width W3 may be substantially the same as each other.In addition, the second length L2 and the third length L3 may besubstantially the same as each other.

The third pixel area PXA3 may extend from the first pixel area PXA1 andbe directly connected to the first pixel area PXA1. For example, oneside of the third pixel area PXA3 may contact one side of the firstpixel area PXA1.

The third peripheral area PPA3 may be provided on at least one side ofthe third pixel area PXA3. According to one embodiment, the thirdperipheral area PPA3 may surround the third pixel area PXA3 exceptportions where the first pixel area PXA1 and the third pixel area PXA3are connected to each other. According to one embodiment, the thirdperipheral area PPA3 may include a horizontal portion extending in thefirst direction DR1 and vertical portions extending in the seconddirection DR2. The vertical portions of the third peripheral area PPA3may be provided as a pair and separated from each other in the firstdirection DR1 by the first pixel area PXA1.

According to one embodiment, the third area A3 and the second area A2may have a line symmetry with respect to an imaginary center lineextending in the second direction DR2 from an intermediate point of thehorizontal portion of the first peripheral area PPA1 of the first areaA1. The arrangement of the respective elements provided in the thirdarea A3 may be substantially the same as that of the second area A2,except for some of the lines.

The second area A2 and the third area A3 may extend from the first areaA1 of the substrate SUB in the second direction DR2. In addition, sincethe second area A2 and the third area A3 are separated from each other,a portion between the second area A2 and the third area A3 of thesubstrate SUB may be depressed. For example, the substrate SUB may havea notch between the second area A2 and the third area A3.

According to one embodiment, the vertical portions of the firstperipheral area PPA1 may be connected to some of the vertical portionsof the second peripheral area PPA2 and the third peripheral area PPA3.For example, the left vertical portion of the first peripheral area PPA1and the left vertical portion of the second peripheral area PPA2 may beconnected to each other, and the right vertical portion of the firstperipheral area PPA1 and the right vertical portion of the thirdperipheral area PPA3 may be connected to each other. In addition, theleft vertical portion of the first peripheral area PPA1 and the leftvertical portion of the second peripheral area PPA2 may have the samewidth (W4; hereinafter ‘fourth width’). The right vertical portion ofthe first peripheral area PPA1 and the right vertical portion of thethird peripheral area PPA3 may have the same width (W5; hereinafter,‘fifth width’).

The fourth width W4 may be different from the fifth width W5. Forexample, the fourth width W4 may be shorter than the fifth width W5.

According to one embodiment, the substrate SUB may further include anadditional peripheral area APA. The additional peripheral area APA maybe provided adjacent to the first pixel area PXA1, the second peripheralarea PPA2, and the third peripheral area PPA3. For example, theadditional peripheral area APA may connect the second peripheral areaPPA2 and the third peripheral area PPA3 to each other. Morespecifically, the additional peripheral area APA may connect the rightvertical portion of the second peripheral area PPA2 and the leftvertical portion of the third peripheral area PPA3 to each other. Inaddition, the additional peripheral area APA may be provided on the sideof the first pixel area PXA1 between the second area A2 and the thirdarea A3.

The pixels PXL may be provided in the pixel areas PXA on the substrateSUB including the first, second, and third pixel areas PXA1, PXA2, andPXA3. Each of the pixels PXL may include a display element that emitslight. For example, the display element may be any one of a liquidcrystal display (LCD) device, an electrophoretic display (EPD) device,an electrowetting display device (EWD), and an organic light emittingdisplay (OLED) device. Hereinafter, for convenience of explanation, thedisplay element of an organic light emitting display device is describedas an example.

Each of the pixels PXL may emit light of one of red, green, and blue.However, the present disclosure is not limited thereto. For example,each of the pixels PXL may emit light of cyan, magenta, yellow andwhite.

The pixels PXL may include first pixels PXL1 arranged in the first pixelarea PXA1, second pixels PXL2 arranged in the second pixel area PXA2,and third pixels PXL3 arranged in the third pixel area PXA3. Accordingto one embodiment, each of the first, second, and third pixels PXL1,PXL2, and PXL3 may be arranged in a matrix format including rowsextending in the first direction DR1 and columns extending in the seconddirection DR2. However, the arrangement of the first, second, and thirdpixels PXL1, PXL2, and PXL3 may not be particularly limited thereto. Inother words, the first, second, and third pixels PXL1, PXL2, and PXL3may have various arrangements.

In the second area A2 and the third area A3, the number of second pixelsPXL2 and the number of third pixels PXL3 may vary according to each row.Referring to FIG. 2, in the second area A2 and the third area A3, thenumber of second pixels PXL2 and the number of third pixels PXL3arranged in a row corresponding to a sloped corner may be smaller thanthe number of second pixels PXL2 and the number of third pixels PXL3arranged in a row corresponding to straight sides that are close to thefirst pixel area A1. In addition, the number of second pixels PXL2 andthe number of third pixels PXL3 arranged in the row may decrease as thelength of the row decreases. As a result, a length of a line connectingthe second and third pixels PXL2 and PXL3 arranged in the sloped cornermay be reduced.

The driver may supply a signal to each pixel through a correspondingline part so as to control the driving of each pixel PXL. FIGS. 1 and 2illustrate only second and third scan lines S2 and S3 and second andthird emission control lines E2 and E3 of the line part. The second scanline S2 and the second emission control line E2 may be provided in thesecond pixel area PXA2, and the third scan line S3 and the thirdemission control line E3 may be provided in the third pixel area PXA3.Particularly, the second scan line S2 and the second emission controlline E2 may extend to the second peripheral area PPA2, and the thirdscan line S3 and the third emission control line E3 may extend to thethird peripheral area PPA3. A detailed description of the line part isdescribed below with reference to FIG. 3.

The driver may include scan drivers (SDV1, SDV2, and SDV3; hereinafter,‘SDV’) supplying scan signals to the respective pixels PXL along scanlines, emission drivers (EDV1, EDV2, and EDV3; hereinafter, ‘EDV’)supplying emission control signals to the respective pixels PXL alongemission control lines, a data driver DDV supplying data signals to therespective pixels PXL along data lines, and a timing controller (notillustrated). The timing controller may control the scan drivers SDV,the emission drivers EDV, and the data driver DDV.

According to one embodiment, the scan drivers SDV may include a firstscan driver SDV1 connected to the first pixels PXL1, a second scandriver SDV2 connected to the second pixels PXL2, and a third scan driverSDV3 connected to the third pixels PXL3. According to one embodiment,the emission drivers EDV may include a first emission driver EDV1connected to the first pixels PXL1, a second emission driver EDV2connected to the second pixels PXL2, and a third emission driver EDV3connected to the third pixels PXL3.

The first scan driver SDV1 may be disposed on at least one of thevertical portions of the first peripheral area PPA1. Since the verticalportions of the first peripheral area PPA1 are provided as a pair thatis separated from each other in the first direction DR1 by the firstpixel area PXA1, the first scan driver SDV1 may be disposed on at leastone of the pair of vertical portions of the first peripheral area PPA1.The first scan driver SDV1 may extend in the second direction DR2.

In a similar manner, the second scan driver SDV2 may be provided in thesecond peripheral area PPA2, and the third scan driver SDV3 may beprovided in the third peripheral area PPA3.

Similarly to the first scan driver SDV1, the first emission driver EDV1may be disposed on at least one of the vertical portions of the firstperipheral area PPA1. The first emission driver EDV1 may extend in thesecond direction DR2.

In a similar manner, the second emission driver EDV2 may be disposed inthe second peripheral area PPA2, and the third emission driver EDV3 maybe disposed in the third peripheral area PPA3.

The data driver DDV may be disposed in the first peripheral area PPA1.For example, the data driver DDV may be disposed in the horizontalportion of the first peripheral area PPA1. The data driver DDV mayextend in the first direction DR1.

According to some embodiments, the locations of the scan drivers SDV,the emission drivers EDV, and/or the data driver DDV may be switchedwith each other if necessary.

The timing controller (not illustrated) may be connected to the first,second, and third scan drivers SDV1, SDV2, and SDV3, the first, second,and third emission drivers EDV1, EDV2, and EDV3, and the data driver DDVthrough various lines. However, the arrangement of the timing controlleris not particularly limited thereto. For example, the timing controllermay be mounted onto a printed circuit board and connected to the first,second, and third scan drivers SDV1, SDV2, and SDV3, the first, second,and third emission drivers EDV1, EDV2, and EDV3, and the data driver DDVthrough the printed circuit board. The printed circuit board may be aflexible printed circuit board and disposed at various locations such asone side surface of the substrate SUB or a rear surface of the substrateSUB.

The power supply unit may include one or more power supply lines. Forexample, the power supply unit may include a first power supply lineELVDD and a second power supply line ELVSS. The first power supply lineELVDD and the second power supply line ELVSS may apply power to thefirst pixels PXL1, the second pixels PXL2, and the third pixels PXL3.

One of the first power supply line ELVDD and the second power supplyline ELVSS, for example, the second power supply line ELVSS may bedisposed so as to correspond to at least one side of the firstperipheral area PPA1, one side of the second peripheral area PPA2, andone side of the third peripheral area PPA3. For example, the secondpower supply line ELVSS may be disposed in the region where the datadriver DDV of the first peripheral area PPA1 is disposed. In addition,the second power supply line ELVSS may extend in the first direction DR1in the first peripheral area PPA1.

The other power supply line, i.e., the first power supply line ELVDD maybe disposed to surround the first pixel area PXA1, the second pixel areaPXA2 and the third pixel area PXA3, except the region where the datadriver DDV of the first peripheral area PPA1 is disposed. For example,the first power supply line ELVDD may extend along the left verticalportion of the first peripheral area PPA1, the second peripheral areaPPA2, the third peripheral area PPA3, the additional peripheral areaAPA, and the right vertical portion of the first peripheral area PPA1.

As described above, for example, the second power supply line ELVSS maybe disposed in the first peripheral area PPA1 so as to correspond to oneside of the first pixel area PXA1, and the first power supply line ELVDDis disposed in the remaining peripheral areas PPA. However, the presentdisclosure is not limited thereto. For example, the first power supplyline ELVDD and the second power supply line ELVSS may be disposed tosurround the first pixel area PXA1, the second pixel area PXA2, and thethird pixel area PXA3.

A voltage applied to the first power supply line ELVDD may be higherthan a voltage applied to the second power supply line ELVSS.

A length of the second scan line S2 provided in the second pixel areaPXA2 and a length of the third scan line S3 provided in the third pixelarea PXA3 may be different from a length of the first scan line providedin the first pixel area PXA1. In the same manner, a length of the secondemission control line E2 connected to the second pixel area PXA2 and alength of the third emission control line E3 connected to the thirdpixel area PXA3 may be different from a length of a first emissioncontrol line E1 connected to the first pixel area PXA1. The differencein length of the lines provided in the pixel areas PXA may cause adifference in a load value of the pixel areas PXA.

According to one embodiment, to compensate for the difference in a loadvalue between the respective pixel areas PXA, a dummy part DMP having adifferent parasitic capacitance may be used in the peripheral area PPAcorresponding to each pixel area PXA. According to one embodiment, thedummy part DMP may be disposed in each of the second peripheral areaPPA2 and the third peripheral area PPA3. However, the present disclosureis not limited thereto. The dummy part DMP is described below withreference to FIG. 8.

FIG. 3 is a block diagram illustrating an embodiment of pixels and adriver of the display device shown in FIG. 1. In FIG. 3, for convenienceof explanation, the first power supply is denoted by the same referencecharacters as the first power supply line ELVDD shown in FIG. 1, and thesecond power supply is denoted by the same reference characters as thesecond power supply line ELVSS as shown in FIG. 1.

Referring to FIGS. 1 and 3, the display device according to oneembodiment may include the pixels PXL, the driver, and the line part.

The pixels PXL may include the first, second, and third pixels PXL1,PXL2, and PXL3, and the driver may include the first, second, and thirdscan drivers SDV1, SDV2, and SDV3, the first, second, and third emissiondrivers EDV1, EDV2, and EDV3, the data driver DDV, and a timingcontroller TC. In FIG. 3, the locations of the first, second, and thirdscan drivers SDV1, SDV2, and SDV3, the first, second, and third emissiondrivers EDV1, EDV2, and EDV3, the data driver DDV, and the timingcontroller TC are shown for convenience of explanation. At the time ofmanufacturing the display device, these locations may be changed in thedisplay device. For example, the data driver DDV may be disposed moreadjacent to the second area A2 and the third area A3 than to the firstarea A1. However, the present disclosure is not limited thereto. Forexample, the data driver DDV may be disposed in an area adjacent to thefirst area A1.

The line part supplying various signals from the driver to each of thepixel PXL may include scan lines, data lines D1 to Dm, emission controllines, the first power supply line ELVDD, the second power supply lineELVSS (see FIG. 1) and an initialization power supply line (notillustrated). The scan lines may include first, second, and third scanlines S11 to S1 n, S21 and S22, and S31 and S32 connected to the first,second, and third pixels PXL1, PXL2, and PXL3, respectively. Theemission control lines may include first, second, and third emissioncontrol lines E11 to E1 n, E21 to E22, and E31 to E32 connected to thefirst, second, and third pixels PXL1, PXL2, and PXL3, respectively. Thedata lines D1 to Dm and the first and second power supply lines ELVDDand ELVSS may be connected to the first, second, and third pixels PXL1,PXL2, and PXL3, respectively.

The first pixels PXL1 may be disposed in the first pixel area PXA1. Thefirst pixels PXL1 may be connected to the first scan lines S11 to S1 n,the first emission control lines E11 to E1 n, and the data lines D1 toDm. The first pixels PXL1 may receive data signals from the data linesD1 to Dm when scan signals are supplied from the first scan lines S11 toS1 n. The first pixels PXL1 receiving the data signals may control anamount of current flowing from the first power supply ELVDD via anorganic light emitting diode OLED to the second power supply ELVSS.

The second pixels PXL2 may be disposed in the second pixel area PXA2.The second pixels PXL2 may be connected to the second scan lines S21 andS22, the second emission control lines E21 to E22, and the data lines D1to D3. The second pixels PXL2 may receive data signals from the datalines D1 to Dm when scan signals are supplied from the second scan linesS21 and S22. The second pixels PXL2 receiving the data signals maycontrol an amount of current flowing from the first power supply ELVDDvia the organic light emitting device to the second power supply ELVSS.

The third pixels PXL3 may be disposed in the third pixel area PXA3. Thethird pixels PXL3 may be connected to the third scan lines S31 to S32,the third emission control lines E31 to E32, and the data lines D1 toDm. The third pixels PXL3 may receive data signals from the data linesD1 to Dm when scan signals are supplied from the third scan lines S31 toS32. The third pixels PXL3 receiving the data signals may control anamount of current flowing from the first power supply ELVDD via theorganic light emitting device to the second power supply ELVSS.

The first scan driver SDV1 may supply scan signals to the first scanlines S11 to S1 n in response to a first gate control signal GCS1 fromthe timing controller TC. For example, the first scan driver SDV1 maysequentially supply the scan signals to the first scan lines S11 to S1n. When the scan signals are sequentially supplied to the first scanlines S11 to S1 n, the first scan driver SDV1 may sequentially selectthe first pixels PXL1 arranged in horizontal lines.

The second scan driver SDV2 may supply scan signals to the second scanlines S21 and S22 in response to a second gate control signal GCS2 fromthe timing controller TC. For example, the second scan driver SDV2 maysequentially select the second pixels PXL2 arranged in horizontal lineswhen the scan signals are sequentially supplied to the second scan linesS21 and S22.

The third scan driver SDV3 may supply scan signals to the third scanlines S31 and S32 in response to a third gate control signal GCS3 fromthe timing controller TC. For example, the third scan driver SDV maysequentially select the third pixels PXL3 arranged in horizontal lineswhen the scan signals are supplied to the third scan lines S31 and S32.

The first emission driver EDV1 may supply emission control signals tothe first emission control lines E11 to E1 n in response to a fourthgate control signal GCS4 from the timing controller TC. For example, thefirst emission driver EDV1 may sequentially supply the emission controlsignals to the first emission control lines E11 to E1 n.

The emission control signals may be set to have a greater width than thescan signals. For example, an emission control signal supplied to ani-th first emission control line E1 i may be supplied to overlap with atleast a portion of a period during which scan signals are respectivelysupplied to an (i−1)th first scan line S1 i−1 and an i-th first scanline S1 i, where i is a natural number.

The second emission driver EDV2 may supply emission control signals tothe second emission control lines E21 to E22 in response to a fifth gatecontrol signal GCS5 from the timing controller TC. For example, thesecond emission driver EDV2 may sequentially supply the emission controlsignals to the second emission control lines E21 to E22.

The third emission driver EDV3 may supply emission control signals tothe third emission control lines E31 and E32 in response to a sixth gatecontrol signal GCS6 from the timing controller TC. For example, thethird emission driver EDV3 may sequentially supply the emission controlsignals to the third emission control lines E31 and E32.

In addition, the emission control signals may be set to a gate offvoltage (e.g., a high voltage) so that transistors included in thepixels PXL may be turned off, and the scan signals may be set to a gateon voltage (e.g., a low voltage) so that the transistors included in thepixels PXL may be turned on.

The data driver DDV may supply data signals to the data lines D1 to Dmin response to a data control signal DCS. The data signals supplied tothe data lines D1 to Dm may be supplied to the pixels PXL selected bythe scan signals.

The timing controller TC may supply the first to sixth gate controlsignals GCS1 to GCS6 generated based on externally supplied timingsignals to the scan drivers SDV and the emission drivers EDV and supplythe data control signal DCS to the data driver DDV.

Each of the first to sixth gate control signals GCS1 to GCS6 may includea start pulse and clock signals. The start pulse may control the timingof the first scan signal or the first emission control signal. The clocksignals may be used to shift the start pulse.

The data control signal DCS may include a source start pulse and clocksignals. The source start pulse may control a sampling start point ofdata. The clock signals may be applied to control a sampling operation.

As described above, in the display device according to one embodiment,the pixels PXL may be provided in the areas A1, A2, and A3 havingdifferent sizes. Lengths of the scan lines S11 to S1 n, S21 to S22, andS31 to S32 and the emission control lines E11 to E1 n, E21 to E22, andE31 to E32 supplying signals to the pixels PXL may vary depending on theareas A1, A2, and A3, more specifically, depending on the sizes of thepixel areas PXA. For example, the first width W1 in the first pixel areaPXA1 may be greater than the second width W2 in the second pixel areaPXA2 as shown in FIG. 1. Therefore, when the scan lines S11 to S1 n, S21to S22, and S31 to S32 and the emission control lines E11 to E1 n, E21to E22, and E31 to E32 extend in a width direction (e.g., the firstdirection DR1), the first scan lines S11 to S1 n and the first emissioncontrol lines E11 to E1 n may have greater lengths than the second scanlines S21 and S22 and the second emission control lines E21 to E22,respectively. The difference in length of the scan lines S11 to S1 n,S21 to S22, and S31 to S32 and the difference in length of the emissioncontrol lines E11 to E1 n, E21 to E22, and E31 to E32 may cause adifference in a load value between the scan lines S11 to S1 n, S21 toS22, and S31 to S32 and a difference in a load value between theemission control lines E11 to E1 n, E21 to E22, and E31 to E32,respectively. In other words, the first scan lines S11 to S1 n may havegreater load values than the second scan lines S21 and S22. In addition,the first emission control lines E11 to E1 n may have greater loadvalues than the second emission control lines E21 and E22. A drop of thedata signals may cause a brightness difference between the first pixelsPXL1 of the first pixel area PXA1 and the second pixels PXL2 of thesecond pixel area PXA2. Since the third pixels PXL3 of the third pixelarea PXA3 may have the same configuration as the second pixels PXL2, adetailed description of the third pixels PXL3 will be omitted.

FIG. 4 is a circuit diagram of an embodiment of one of the first pixelsPXL1 shown in FIG. 3. For convenience of explanation, FIG. 4 illustratesa pixel connected to an m-th data line Dm and the i-th first scan lineS1 i.

Referring to FIGS. 3 and 4, the first pixel PXL1 may include the organiclight emitting diode OLED, first to seventh transistors T1 to T7, and astorage capacitor Cst.

An anode of the organic light emitting diode OLED may be connected tothe first transistor T1 via the sixth transistor T6 and a cathodethereof may be connected to the second power supply ELVSS. The organiclight emitting diode OLED may generate light with a brightness inresponse to the amount of current supplied from the first transistor T1.

The first power supply ELVDD may be set to have a greater voltage thanthe second power supply ELVSS so that current may flow through theorganic light emitting diode OLED.

The seventh transistor T7 may be connected between an initializationpower supply Vint and the anode of the organic light emitting diodeOLED. In addition, a gate electrode of the seventh transistor T7 may beconnected to the i-th first scan line S1 i. The seventh transistor T7may be turned on when a scan signal is supplied to the i-th first scanline S1 i to supply a voltage of the initialization power supply Vint tothe anode of the organic light emitting diode OLED. The initializationpower supply Vint may be set to have a lower voltage than a data signal.

The sixth transistor T6 may be connected between the first transistor T1and the organic light emitting diode OLED. In addition, a gate electrodeof the sixth transistor T6 may be connected to the i-th first emissioncontrol line E1 i. The sixth transistor T6 may be turned off when anemission control signal is supplied to the i-th first emission controlline E1 i and turned on for a remaining period.

The fifth transistor T5 may be connected between the first power supplyELVDD and the first transistor T1. In addition, a gate electrode of thefifth transistor T5 may be connected to the i-th first emission controlline E1 i. The fifth transistor T5 may be turned off when an emissioncontrol signal is supplied to the i-th first emission control line E1 iand turned on for a remaining period.

A first electrode of the first transistor T1 (driving transistor) may beconnected to the first power supply ELVDD via the fifth transistor T5,and a second electrode of the first transistor T1 may be connected tothe anode of the organic light emitting diode OLED via the sixthtransistor T6. In addition, a gate electrode of the first transistor T1may be connected to a first node N1. The first transistor T1 may controlan amount of current flowing from the first power supply ELVDD via theorganic light emitting diode OLED to the second power supply ELVSS inresponse to a voltage of the first node N1.

The third transistor T3 may be connected between the second electrode ofthe first transistor T1 and the first node N1. In addition, a gateelectrode of the third transistor T3 may be connected to the i-th firstscan line S1 i. The third transistor T3 may be turned on when a scansignal is supplied to the i-th first scan line S1 i to electricallyconnect the second electrode of the first transistor T1 to the firstnode N1. Therefore, when the third transistor T3 is turned on, the firsttransistor T1 may be connected as a diode.

The fourth transistor T4 may be connected between the first node N1 andthe initialization power supply Vint. In addition, a gate electrode ofthe fourth transistor T4 may be connected to the (i−1)th first scan lineS1 i−1. The fourth transistor T4 may be turned on when a scan signal issupplied to an (i−1)th first scan line S1 i−1 to supply the voltage ofthe initialization power supply Vint to the first node N1.

The second transistor T2 may be connected between the m-th data line Dmand the first electrode of the first transistor T1. In addition, a gateelectrode of the second transistor T2 may be connected to the i-th firstscan line S1 i. The second transistor T2 may be turned on when a scansignal is supplied to the i-th first scan line S1 i to electricallyconnect the m-th data line Dm to the first electrode of the firsttransistor T1.

The storage capacitor Cst may be connected between the first powersupply ELVDD and the first node N1. The storage capacitor Cst may storea voltage corresponding to the data signal and a threshold voltage ofthe first transistor T1.

The second pixel PXL2 and the third pixel PXL3 may have the same circuitas the first pixel PXL1. Therefore, a detailed description of the secondpixel PXL2 and the third pixel PXL3 is omitted.

FIG. 5 is a detailed plan view of the first pixel shown in FIG. 4. FIG.6 is a cross-sectional view taken along line I-I′ of FIG. 5. FIG. 7 is across-sectional view taken along line II-IT of FIG. 5. FIGS. 5 to 7illustrate the two first scan lines S1 i−1 and S1 i, the first emissioncontrol line E1 i, a power supply line PL, and a data line Dj that areconnected to one first pixel PXL1 arranged in an i-th row and a j-thcolumn in the first pixel area PXA1 on the basis of the first pixelPXL1. For convenience of explanation, FIGS. 5 to 7 illustrate a firstscan line in an (i−1)th row as an “(i−1)th first scan line S1 i−1”, afirst scan line in the i-th row as the “i-th first scan line S1 i”, anemission control line in the i-th row as the “emission control line E1i”, a data line in the j-th row as the “data line Dj”, and a powersupply line in the j-th row as the “power supply line PL”.

Referring to FIGS. 4 to 7, a display device according to one embodimentmay include the substrate SUB, the line part, and the pixels, forexample, the first pixels PXL1.

The substrate SUB may include a transparent insulating material totransmit light. In one embodiment, the substrate SUB may be a rigidsubstrate. For example, the substrate SUB may be one of a glasssubstrate, a quartz substrate, a glass ceramic substrate, and acrystalline glass substrate.

In some embodiments, the substrate SUB may be a flexible substrate. Thesubstrate SUB may be one of a plastic substrate and a film substrateincluding a high molecular organic material. For example, the substrateSUB may include at least one of polystyrene, polyvinyl alcohol,polymethyl methacrylate, polyethersulfone, polyacrylate, polyetherimide,polyethylene naphthalate, polyethylene terephthalate, polyphenylenesulfide, polyarylate, polyimide, polycarbonate, triacetate cellulose,and cellulose acetate propionate. However, the substrate SUB may includevarious materials in addition to the above materials. For example, thesubstrate SUB may include fiber reinforced plastic (FRP).

The line part may supply signals to the first pixels PXL1 and includethe first scan lines S1 i−1 and S1 i, the data line Dj, the emissioncontrol line E1 i, the power supply line PL, and an initialization powersupply line IPL.

The first scan lines S1 i−1 and S1 i may extend in the first directionDR1. The first scan lines S1 i−1 and S1 i may include the (i−1)th firstscan line S1 i−1 and the i-th first scan line S1 i that are sequentiallyarranged in the second direction DR2 that crosses the first directionDR1. The first scan lines S1 i−1 and S1 i may receive scan signals. Forexample, the (i−1)th first scan line S1 i−1 may receive an (i−1)th scansignal and the i-th first scan line S1 i may receive an i-th scansignal. The i-th first scan line S1 i may be branched into two lines,and the two lines into which the i-th first scan line S1 i is branchedmay be connected to different transistors. For example, the i-th firstscan line S1 i may include an upper i-th first scan line S1 i that isadjacent to the (i−1)th first scan line S1 i−1 and a lower i-th firstscan line S1 i that is distant from the (i−1)th first scan line S1 i−1than the upper i-th first scan line S1 i.

The emission control line E1 i may extend in the first direction DR1.The emission control line E1 i may be separated from the (i−1)th firstscan line S1 i−1 and the i-th first scan lines S1 i and arranged betweenthe two first scan lines S1 i−1 and S1 i. The emission control line E1 imay receive an emission control signal.

The data line Dj may extend in the second direction DR2 and receive adata signal.

The power supply line PL may extend in the second direction DR2. Thepower supply line PL may be separated from the data line Dj. The powersupply line PL may receive the first power signal through the firstpower supply line ELVDD.

The initialization power supply line IPL may extend in the firstdirection DR1. The initialization power supply line IPL may be providedbetween the i-th first scan line S1 i and the (i−1)th first scan line S1i−1 of a pixel. The initialization power supply line IPL may receive theinitialization power supply Vint.

Each of the first pixels PXL1 may include the first to seventhtransistors T1 to T7, the storage capacitor Cst, and the organic lightemitting diode OLED.

The first transistor T1 may include a first gate electrode GE1, a firstactive pattern ACT1, a first source electrode SE1, a first drainelectrode DE1, and a first connection line CNL1.

The first gate electrode GE1 may be connected to a third drain electrodeDE3 of the third transistor T3 and a fourth drain electrode DE4 of thefourth transistor T4.

The first connection line CNL1 may connect the first gate electrode GE1to the third and fourth drain electrodes DE3 and DE4. One end of thefirst connection line CNL1 may be connected to the first gate electrodeGE1 through a first contact hole CH1, and the other end of the firstconnection line CNL1 may be connected to the third and fourth drainelectrodes DE3 and DE4 through a second contact hole CH2.

According to one embodiment, each of the first active pattern ACT1, thefirst source electrode SE1, and the first drain electrode DEI mayinclude a semiconductor layer, and the semiconductor layer may or maynot be doped with impurities. For example, the first source electrodeSE1 and the first drain electrode DE1 may include a semiconductor layerthat is doped with impurities, and the first active pattern ACT1 mayinclude a semiconductor layer that is not doped with impurities.

The first active pattern ACT1 may have a bar shape extending in a lengthdirection and be bent a plurality of times in the extending lengthdirection. The first active pattern ACT1 may overlap with the first gateelectrode GE1 as viewed in the plane. Since the first active patternACT1 extends in the length direction, a channel region of the firsttransistor T1 may also extend in the same length direction. Therefore, adriving range of a gate voltage applied to the first transistor T1 maybe widened. Therefore, it is possible to minutely control a grayscale oflight emitted from the organic light emitting diode OLED.

The first source electrode SE1 may be connected to one end of the firstactive pattern ACT1. The first source electrode SE1 may be connected tothe second drain electrode DE2 of the second transistor T2 and a fifthdrain electrode DE5 of the fifth transistor T5. The first drainelectrode DE1 may be connected to the other end of the first activepattern ACT1. The first drain electrode DE1 may be connected to a thirdsource electrode SE3 of the third transistor T3 and a sixth sourceelectrode SE6 of the sixth transistor T6.

The second transistor T2 may include a second gate electrode GE2, asecond active pattern ACT2, a second source electrode SE2, and thesecond drain electrode DE2.

The second gate electrode GE2 may be connected to the upper i-th firstscan line S1 i. The second gate electrode GE2 may be provided as aportion of the upper i-th first scan line S1 i or protrude from theupper i-th first scan line S1 i. According to one embodiment, each ofthe second active pattern ACT2, the second source electrode SE2, and thesecond drain electrode DE2 may be a semiconductor layer, and thesemiconductor layer may or may not be doped with impurities. Forexample, each of the second source electrode SE2 and the second drainelectrode DE2 may include a semiconductor layer that is doped withimpurities, whereas the second active pattern ACT2 may include asemiconductor layer that is not doped with impurities. The second activepattern ACT2 may overlap with the second gate electrode GE2. One end ofthe second source electrode SE2 may be connected to the second activepattern ACT2. The other end of the second source electrode SE2 may beconnected to the data line Dj through a sixth contact hole CH6. One endof the second drain electrode DE2 may be connected to the second activepattern ACT2. The other end of the second drain electrode DE2 may beconnected to the first source electrode SE1 of the first transistor T1and a fifth drain electrode DE5 of the fifth transistor T5.

The third transistor T3 may have a dual gate structure capable ofpreventing current leakage. For example, the third transistor T3 mayinclude a 3a-th transistor T3 a and a 3b-th transistor T3 b. The 3a-thtransistor T3 a may include a 3a-th gate electrode GE3 a, a 3a-th activepattern ACT3 a, a 3a-th source electrode SE3 a, and a 3a-th drainelectrode DE3 a. The 3b-th transistor T3 b may include a 3b-th gateelectrode GE3 b, a 3b-th active pattern ACT3 b, a 3b-th source electrodeSE3 b, and a 3b-th drain electrode DE3 b. Hereinafter, the 3a-th gateelectrode GE3 a and the 3b-th gate electrode GE3 b may be collectivelyreferred to as a third gate electrode GE3, the 3a-th active pattern ACT3a and the 3b-th active pattern ACT3 b may be collectively referred to asa third active pattern ACT3, the 3a-th source electrode SE3 a and the3b-th source electrode SE3 b may be collectively referred to as a thirdsource electrode SE3, and the 3a-th drain electrode DE3 a and the 3b-thdrain electrode DE3 b may be collectively referred to as a third drainelectrode DE3.

The third gate electrode GE3 may be connected to the upper i-th firstscan line S1 i. The third gate electrode GE3 may be provided as aportion of the upper i-th first scan line S1 i or extend from the upperi-th first scan line S1 i. For example, the 3a-th gate electrode GE3 amay protrude from the upper i-th first scan line S1 i, and the 3b-thgate electrode GE3 b may be provided as the upper i-th first scan lineS1 i.

Each of the third active pattern ACT3, the third source electrode SE3,and the third drain electrode DE3 may include a semiconductor layer, andthe semiconductor layer may or may not be doped with impurities. Forexample, the third source electrode SE3 and the third drain electrodeDE3 may include a semiconductor layer that is doped with impurities, andthe third active pattern ACT3 may include a semiconductor layer that isnot doped with impurities. The third active pattern ACT3 may overlapwith the third gate electrode GE3. One end of the third source electrodeSE3 may be connected to the third active pattern ACT3. The other end ofthe third source electrode SE3 may be connected to the first drainelectrode DE1 of the first transistor T1 and the sixth source electrodeSE6 of the sixth transistor T6. One end of the third drain electrode DE3may be connected to the third active pattern ACT3. The other end of thethird drain electrode DE3 may be connected to the fourth drain electrodeDE4 of the fourth transistor T4. In addition, the third drain electrodeDE3 may be connected to the first gate electrode GE1 of the firsttransistor T1 through the first connection line CNL1, the second contacthole CH2, and the first contact hole CH1.

The fourth transistor T4 may have a dual gate structure capable ofpreventing current leakage. For example, the fourth transistor T4 mayinclude a 4a-th transistor T4 a and a 4b-th transistor T4 b. The 4a-thtransistor T4 a may include a 4a-th gate electrode GE4 a, a 4a-th activepattern ACT4 a, a 4a-th source electrode SE4 a, and a 4a-th drainelectrode DE4 a. The 4b-th transistor T4 b may include a 4b-th gateelectrode GE4 b, a 4b-th active pattern ACT4 b, a 4b-th source electrodeSE4 b, and a 4b-th drain electrode DE4 b. Hereinafter, the 4a-th gateelectrode GE4 a and the 4b-th gate electrode GE4 b may be collectivelyreferred to as a fourth gate electrode GE4, the 4a-th active patternACT4 a and the 4b-th active pattern ACT4 b may be collectively referredto as a fourth active pattern ACT4, the 4a-th source electrode SE4 a andthe 4b-th source electrode SE4 b may be collectively referred to as afourth source electrode SE4, and the 4a-th drain electrode DE4 a and the4b-th drain electrode DE4 b may be collectively referred as a fourthdrain electrode DE4.

The fourth gate electrode GE4 may be connected to the (i−1)th first scanline S1 i−1. The fourth gate electrode GE4 may be provided as a portionof the (i−1)th first scan line S1 i−1 or extend from the (i−1)th firstscan line S1 i−1. For example, the 4a-th gate electrode GE4 a may beprovided as the (i−1)th first scan line S1 i−1. The 4b-th gate electrodeGE4 b may protrude from the (i−1)th first scan line S1 i−1.

Each of the fourth active pattern ACT4, the fourth source electrode SE4,and the fourth drain electrode DE4 may include a semiconductor layer,and the semiconductor layer may or may not be doped with impurities. Forexample, the fourth source electrode SE4 and the fourth drain electrodeDE4 may include a semiconductor layer that is doped with impurities, andthe fourth active pattern ACT4 may include a semiconductor layer that isnot doped with impurities. The fourth active pattern ACT4 may overlapthe fourth gate electrode GE4.

One end of the fourth source electrode SE4 may be connected to thefourth active pattern ACT4. The other end of the fourth source electrodeSE4 may be connected to the initialization power supply line IPL of thefirst pixel PXL1 in an (i−1)th row and a seventh drain electrode DE7connected to the seventh transistor T7 of the first pixel PXL1 in the(i−1)th row. An auxiliary connection line AUX may be provided betweenthe fourth source electrode SE4 and the initialization power supply lineIPL. One end of the auxiliary connection line AUX may be connected tothe fourth source electrode SE4 through a ninth contact hole CH9. Theother end of the auxiliary connection line AUX may be connected to theinitialization power supply line IPL in the (i−1)th row through aneighth contact hole CH8 of the first pixel PXL1 in the (i−1)th row. Oneend of the fourth drain electrode DE4 may be connected to the fourthactive pattern ACT4. The other end of the fourth drain electrode DE4 maybe connected to the third drain electrode DE3 of the third transistorT3. The fourth drain electrode DE4 may be connected to the first gateelectrode GE1 of the first transistor T1 through the first connectionline CNL1, the second contact hole CH2, and the first contact hole CH1.

The fifth transistor T5 may include a fifth gate electrode GE5, a fifthactive pattern ACT5, a fifth source electrode SE5, and a fifth drainelectrode DE5.

The fifth gate electrode GE5 may be connected to the first emissioncontrol line E1 i. The fifth gate electrode GE5 may be provided as aportion of the first emission control line E1 i, or extend from thefirst emission control line E1 i. Each of the fifth active pattern ACT5,the fifth source electrode SE5, and the fifth drain electrode DE5 mayinclude a semiconductor layer, and the semiconductor layer may or maynot be doped with impurities. For example, the fifth source electrodeSE5 and the fifth drain electrode DE5 may include a semiconductor layerthat is doped with impurities. The fifth active pattern ACT5 may overlapwith the fifth gate electrode GE5. One end of the fifth source electrodeSE5 may be connected to the fifth active pattern ACT5. The other end ofthe fifth source electrode SE5 may be connected to the power supply linePL through a fifth contact hole CH5. One end of the fifth drainelectrode DE5 may be connected to the fifth active pattern ACT5. Theother end of the fifth drain electrode DE5 may be connected to the firstsource electrode SE1 of the first transistor T1 and the second drainelectrode DE2 of the second transistor T2.

The sixth transistor T6 may include a sixth gate electrode GE6, a sixthactive pattern ACT6, the sixth source electrode SE6, and a sixth drainelectrode DE6.

The sixth gate electrode GE6 may be connected to the first emissioncontrol line E1 i. The sixth gate electrode GE6 may be provided as apart of the first emission control line E1 i or extend from the firstemission control line E1 i. Each of the sixth active pattern ACT6, thesixth source electrode SE6, and the sixth drain electrode DE6 mayinclude a semiconductor layer, and the semiconductor layer may or maynot be doped with impurities. For example, the sixth source electrodeSE6 and the sixth drain electrode DE6 may include a semiconductor layerthat is doped with impurities, and the sixth active pattern ACT6 mayinclude a semiconductor layer that is not doped with impurities. Thesixth active pattern ACT6 may overlap with the sixth gate electrode GE6.One end of the sixth source electrode SE6 may be connected to the sixthactive pattern ACT6. The other end of the sixth source electrode SE6 maybe connected to the first drain electrode DE1 of the first transistor T1and the third source electrode SE3 of the third transistor T3. The otherend of the sixth drain electrode DE6 may be connected to a seventhsource electrode SE7 of the seventh transistor T7.

The seventh transistor T7 may include a seventh gate electrode GE7, aseventh active pattern ACT7, the seventh source electrode SE7, and theseventh drain electrode DE7.

The seventh gate electrode GE7 may be connected to the lower i-th firstscan line S1 i. The seventh gate electrode GE7 may be provided as aportion of the lower i-th first scan line S1 i or extend from the loweri-th first scan line S1 i. Each of the seventh active pattern ACT7, theseventh source electrode SE7, and the seventh drain electrode DE7 mayinclude a semiconductor layer, and the semiconductor layer may or maynot be doped with impurities. For example, the seventh source electrodeSE7 and the seventh drain electrode DE7 may include a semiconductorlayer that is doped with impurities, and the seventh active pattern ACT7may include a semiconductor layer that is not doped with impurities. Theseventh active pattern ACT7 may overlap with the seventh gate electrodeGE7. One end of the seventh source electrode SE7 may be connected to theseventh active pattern ACT7. The other end of the seventh sourceelectrode SE7 may be connected to the sixth drain electrode DE6 of thesixth transistor T6. One end of the seventh drain electrode DE7 may beconnected to the seventh active pattern ACT7. The other end of theseventh drain electrode DE7 may be connected to the initialization powersupply line IPL. The seventh drain electrode DE7 may be connected to thefourth source electrode SE4 of the fourth transistor T4 of the firstpixel PXL1 arranged in an (i−1)th row. The seventh drain electrode DE7and the fourth source electrode SE4 of the fourth transistor T4 of thefirst pixel PXL1 may be connected to each other through the auxiliaryline AUX, the eighth contact hole CH8, and the ninth contact hole CH9.

The storage capacitor Cst may include a lower electrode LE and an upperelectrode UE. The lower electrode LE may include the first gateelectrode GE1 of the first transistor T1.

The upper electrode UE may overlap with the first gate electrode GE1 andcover the lower electrode LE as viewed in the plane. The capacitance ofthe storage capacitor Cst may be increased by increasing an overlappingarea between the upper electrode UE and the lower electrode LE. Theupper electrode UE may extend in the first direction DR1. According toone embodiment, a voltage having the same level as the first powersupply may be applied to the upper electrode UE. The upper electrode UEmay have an opening OPN at a position corresponding to the first contacthole CH1 where the first gate electrode GE1 and the first connectionline CNL1 contact each other.

The organic light emitting diode OLED may include a first electrode AD,a second electrode CD, and an emitting layer EML that is providedbetween the first electrode AD and the second electrode CD.

The first electrode AD may be provided in an emission area correspondingto each pixel PXL1. The first electrode AD may be connected to theseventh source electrode SE7 of the seventh transistor T7 and the sixthdrain electrode DE6 of the sixth transistor T6 through the seventhcontact hole CH7 and the tenth contact hole CH10. A bridge pattern BRPmay be provided between the seventh contact hole CH7 and the tenthcontact hole CH10. The bridge pattern BRP may connect the sixth drainelectrode DE6, the seventh source electrode SE7, and the first electrodeAD.

Hereinafter, the structure of a display device according to oneembodiment will be described according to a stacking order withreference to FIGS. 5 to 7.

The active patterns (ACT1 to ACT7; hereinafter, ‘ACT’) may be providedon the substrate SUB. The active pattern ACT may include the first toseventh active patterns ACT1 to ACT7. The first to seventh activepatterns ACT1 to ACT7 may include a semiconductor material.

A buffer layer (not illustrated) may be provided between the substrateSUB and the first active pattern ACT1 to the seventh active patternACT7.

A gate insulating layer GI may be provided on the substrate SUB wherethe first active pattern ACT1 and the seventh active pattern ACT7 areprovided.

The (i−1)th first scan line S1 i−1, the i-th first scan line S1 i, theemission control line E1 i, the first gate electrode GE1, and theseventh gate electrode GE7 may be provided on the gate insulating layerGI. The first gate electrode GE1 may be the lower electrode LE of thestorage capacitor Cst. The second gate electrode GE2 and the third gateelectrode GE3 may be formed integrally with the upper i-th first scanline S1 i. The fourth gate electrode GE4 may be formed integrally withthe (i−1)th first scan line S1 i−1. The fifth gate electrode GE5 and thesixth gate electrode GE6 may be formed integrally with the emissioncontrol line E1 i. The seventh gate electrode GE7 may be formedintegrally with the lower i-th first scan line S1 i.

A first interlayer insulating layer IL1 may be provided on the substrateSUB on which the (i−1)th first scan line S1 i−1 is formed.

The upper electrode UE of the storage capacitor Cst and theinitialization power supply line IPL may be provided on the firstinterlayer insulating layer ILL The upper electrode UE of the storagecapacitor Cst may cover the lower electrode LE of the storage capacitorCst. The upper electrode UE and the lower electrode LE may form thestorage capacitor Cst with the first interlayer insulating layer IL1that is interposed therebetween.

A second interlayer insulating layer IL2 may be provided on thesubstrate SUB on which the upper electrode UE of the storage capacitorCst and the initialization power supply line IPL are arranged.

The data line Dj, the power supply line PL, the first connection lineCNL1, the auxiliary connection line AUX, and the bridge pattern BRP maybe provided on the second interlayer insulating layer IL2.

The data line Dj may be connected to the second source electrode SE2through the sixth contact hole CH6 passing through the second interlayerinsulating layer IL2, the first interlayer insulating layer ILL and thegate insulating layer GI.

The power supply line PL may be connected to the upper electrode UE ofthe storage capacitor Cst through the third and fourth contact holes CH3and CH4 passing through the second interlayer insulating layer IL2. Thepower supply line PL may be connected to the fifth source electrode SE5through the fifth contact hole CH5 passing through the second interlayerinsulating layer IL2, the first interlayer insulating layer IL1, and thegate insulating layer GI.

The first connection line CNL1 may be connected to the first gateelectrode GE1 through the first contact hole CH1 passing through thesecond interlayer insulating layer IL2 and the first interlayerinsulating layer ILL In addition, the first connection line CNL1 may beconnected to the third drain electrode DE3 and the fourth drainelectrode DE4 through the second contact hole CH2 passing through thesecond interlayer insulating layer IL2, the first interlayer insulatinglayer IL1, and the gate insulating layer GI.

The auxiliary connection line AUX may be connected to the initializationpower supply line IPL through the eighth contact hole CH8 passingthrough the second interlayer insulating layer IL2. In addition, theauxiliary connection line AUX may be connected to the fourth sourceelectrode SE4 through the ninth contact hole CH9 passing through thesecond interlayer insulating layer IL2, the first interlayer insulatinglayer IL1, and the gate insulating layer GI.

The bridge pattern BRP may be provided between the sixth drain electrodeDE6 and the first electrode AD and serve as a medium for connecting thesixth drain electrode DE6 and the first electrode AD. The bridge patternBRP may be connected to the sixth drain electrode DE6 and the seventhsource electrode SE7 through the seventh contact hole CH7 passingthrough the second interlayer insulating layer IL2, the first interlayerinsulating layer IL1, and the gate insulating layer GI.

A passivation layer PSV may be provided on the substrate SUB on whichthe data line Dj is arranged.

The organic light emitting diode OLED may be provided on the passivationlayer PSV. The organic light emitting diode OLED may include the firstelectrode AD, the second electrode CD, and the emitting layer EML thatis provided between the first electrode AD and the second electrode CD.

The first electrode AD may be provided on the passivation layer PSV. Thefirst electrode AD may be connected to the bridge pattern BRP throughthe tenth contact hole CH10 passing through the passivation layer PSV.Since the bridge pattern BRP is connected to the sixth drain electrodeDE6 and the seventh source electrode SE7 through the seventh contacthole CH7, the first electrode AD may be connected to the sixth drainelectrode DE6 and the seventh source electrode SE7.

A pixel defining layer PDL dividing the pixel area so as to correspondto each pixel PXL may be provided on the substrate SUB on which thefirst electrode AD is disposed. The pixel defining layer PDL may exposethe top surface of the first electrode AD and protrude from thesubstrate SUB along the circumference of each pixel PXL.

The emitting layer EML may be provided in the pixel area surrounded bythe pixel defining layer PDL, and the second electrode CD may beprovided on the emitting layer EML. A sealing layer SLM covering thesecond electrode CD may be provided on the second electrode CD.

One of the first electrode AD and the second electrode CD may be ananode electrode, and the other may be a cathode electrode. For example,the first electrode AD may be an anode electrode, and the secondelectrode CD may be a cathode electrode.

In addition, at least one of the first electrode AD and the secondelectrode CD may be a transmissive electrode. For example, when thelight emitting device (OLED) is a bottom emission type organic lightemitting display device, the first electrode AD may be a transmissiveelectrode, and the second electrode CD may be a reflective electrode.When the light emitting device (OLED) is a top emission type organiclight emitting display device, the first electrode AD is a reflectiveelectrode, and the second electrode CD is a transmissive electrode. Whenthe light emitting device (OLED) is a dual type emission organic lightemitting display device, both the first electrode AD and the secondelectrode CD may be transmissive electrodes. For convenience ofexplanation, an example in which the light emitting device (OLED) is atop emission type organic light emitting display device, and the firstelectrode AD is an anode electrode is described.

The first electrode AD may include a reflective layer (not illustrated)reflecting light and a transparent conductive layer (not illustrated)provided under or above the reflective layer. At least one of thetransparent conductive layer and the reflective layer may be connectedto the sixth drain electrode DE6 and the seventh source electrode SE7.

The reflective layer may include a material capable of reflecting light.For example, the reflective layer may include at least one of aluminum(Al), silver (Ag), chromium (Cr), molybdenum (Mo), platinum (Pt), nickel(Ni), and an alloy thereof.

The transparent conductive layer may include a transparent conductiveoxide. For example, the transparent conductive layer may include atleast one of the transparent conductive oxides including indium tinoxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), Galliumdoped zinc oxide (GZO), zinc tin oxide (ZTO), Gallium tin oxide (GTO),and fluorine doped tin oxide (FTO).

The pixel defining layer PDL may include an organic insulating material.For example, the pixel defining layer PDL may include at least one ofpolystyrene, polymethylmethacrylate (PMMA,), polyacrylonitrile (PAN),polyamide (PA), polyimide (PI), polyarylether (PAE), heterocyclicpolymer, parylene, epoxy, benzocyclobutene (BCB), siloxane based resin,and silane based resin.

The emitting layer EML may be disposed on the exposed surface of thefirst electrode AD. The emitting layer EML may have a multilayer thinfilm structure including at least a light generation layer LGL. Forexample, the emitting layer EML may include a hole injection layer HILfor injecting holes, a hole transport layer HTL, the light generationlayer LGL, a hole blocking layer HBL, an electron transport layer ETL,and an electron injection layer EIL for injecting electrons. The holetransport layer HTL may have excellent hole transportability and blockmovements of electrons that fail to be combined in the light generationlayer LGL so as to increase the chances of recombination between theholes and the electrons. The light generation layer LGL may generatelight by recombination between the injected electrons and holes. Thehole blocking layer HBL may block movements of the holes that fail to becombined in the light generation layer LGL. The electron transport layerETL may be formed to smoothly transport the electrons to the lightgeneration layer LGL.

Light generated from the light generation layer LGL may be of one ofred, green, blue, and white. However, the present disclosure is notlimited thereto. For example, light generated from the light generationlayer of the emitting layer EML may be of one of magenta, cyan, andyellow.

The hole injection layer HIL, the hole transport layer HTL, the holeblocking layer HBL, the electron transport layer ETL and the holeinjection layer HIL may be common layers connected to each other inadjacent emission areas.

The second electrode CD may be a transflective layer. For example, thesecond electrode CD may be a thin metal layer that has enough thicknessto transmit light emitted from the emitting layer EML. The secondelectrode CD may transmit a portion of light emitted from the emittinglayer EML and reflect the remaining portion of light emitted from theemitting layer EML.

The second electrode CD may include a material having a lower workfunction than the transparent conductive layer. For example, the secondelectrode CD may include at least one of molybdenum (Mo), tungsten (W),silver (Ag), magnesium (Mg), aluminum (Al), platinum (Pt), palladium(Pd), gold (Au), nickel (Ni), neodymium (Nd), iridium (Jr), chromium(Cr), lithium (Li), calcium (Ca), and an alloy thereof.

A portion of light emitted from the emitting layer EML may not penetratethe second electrode CD, and light reflected from the second electrodeCD may be reflected again from the first electrode AD. In other words,light emitted from the emitting layer EML may resonate between the firstelectrode AD and the second electrode CD. The resonance of light mayimprove light extraction efficiency of the display device (OLED).

The sealing layer SLM may prevent ingress of oxygen and moisture intothe light emitting device (OLED). The sealing layer SLM may include aninorganic layer (not illustrated). The inorganic layer may include atleast one of silicon oxide, silicon nitride, silicon oxynitride,aluminum oxide, titanium oxide, zirconium oxide, and tin oxide. Thesealing layer SLM may cover the pixel area PXA of each of the first,second, and third areas A1 to A3 as shown in FIG. 3 and extend outwardfrom the pixel area PXA.

Insulating layers including an organic material may be advantageous interms of flexibility and elasticity. However, ingress of moisture oroxygen may be more likely to occur than insulating layers including aninorganic material. According to one embodiment, to prevent ingress ofmoisture or oxygen through the insulating layers including the organicmaterial, end portions of the insulating layers including the organicmaterial may be covered by the insulating layers including the inorganicmaterial and keep the insulating layers including the organic materialfrom being exposed. For example, the passivation layer PSV and the pixeldefining layer PDL including the organic material may extend to aportion of the peripheral area PPA as shown in FIG. 1 of each of thefirst, second, and third areas A1 to A3 as shown in FIG. 1 and may notcover the entire peripheral area PPA. The passivation layer PSV and thepixel defining layer PDL including the organic material may have avalley (not illustrated) formed by removing a portion thereof along thecircumference of the pixel area PXA. The passivation layer PSV, thepixel defining layer PDL, and the valley are described below.

According to one embodiment, the second pixel PXL2 provided in thesecond pixel area PXA2 and the third pixel PXL3 provided in the thirdpixel area PXA3 may have substantially the same pixel structure as thefirst pixel PXL1. Thus, a detailed description thereof will be omitted.

FIG. 8 is a plan view illustrating a portion corresponding to P1 of FIG.1, and FIG. 9 is a cross-sectional view taken along line III-III′ ofFIG. 8. FIGS. 8 and 9 illustrate two second scan lines S2 i−1 and S2 i,a second emission control line E2 i, and two second data lines Dj andDj+1 connected to second pixels PXL2−1 and PXL2−2 on the basis of the(2−1)th pixel PXL2−1 arranged in an i-th row and a j-th column of thesecond pixel area PXA2 and the (2−2)th pixel PXL2−2 arranged in the i-throw and a (j+1)th column. The two second pixels PXL2−1 and PXL2−2 may bearranged closest to the dummy part DMP.

In addition, for convenience of explanation, FIGS. 8 and 9 illustratetwo adjacent second pixels PXL2−1 and PXL2−2 and a portion of the dummypart DMP arranged in the same column as the two adjacent second pixelsPXL2−1 and PXL2−2. In addition, for convenience of explanation, in FIGS.8 and 9, a second scan line in the (i−1)th row may be referred to as an“(i−1)th second scan line S2 i−1”, a second scan line in the i-th rowmay be referred to as an “i-th second scan line S2 i”, an emissioncontrol line in the i-th row may be referred to as an “emission controlline E2 i”, a data line in the j-th column may be referred to as a“first data line DL1”, a data line in a (j+1)th column may be referredto as a “second data line DL2”, a power supply line in the j-th columnmay be referred to as a “first power supply line PL1”, and a powersupply line in the (j+1)th column may be referred to as a “second powersupply line PL2.”

Referring to FIGS. 1, 8, and 9, a display device according to oneembodiment may have a structure in which each of the pixel areas PXA hasa different parasitic capacitance by using the dummy part DMP in orderto compensate for the difference in a load value between the respectivepixel areas PXA. To compensate for the difference in the load valuebetween the scan lines in the first pixel area PXA1, the second pixelarea PXA2 and the third pixel area PXA3, the dummy part DMP may not beprovided in the first peripheral area PPA1 corresponding to the firstpixel area PXA1, whereas the dummy part DMP may be provided in thesecond peripheral area PPA2 corresponding to the second pixel area PXA2and the third peripheral area PPA3 corresponding to the third pixel areaPXA3. In addition, although not shown in FIGS. 1, 8, and 9, the dummypart DMP may also be provided in the additional peripheral area APA.

The display device according to one embodiment may include the substrateSUB, the line part, and the second pixels PXL2−1 and PXL2−2. Inaddition, the line part may include the second scan lines S2 i−1 and S2i, the first and second data lines DL1 and DL2, the emission controlline E2 i, the power supply lines PL1 and PL2, and the initializationpower supply line IPL for supplying signals to the second pixels PXL2−1and PXL2−2.

The second scan lines S2 i−1 and S2 i may be provided in the secondpixel area PXA2 and supply scan signals to the second pixels PXL2−1 andPXL2−2. The second scan lines S2 i−1 and S2 i may have different lengthsfrom the first scan lines S1 l to S1 n that are provided in the firstpixel area PXA1 as shown in FIG. 3. More specifically, the second scanlines S2 i−1 and S2 i may have shorter lengths than the first scan linesS11 to S1 n.

The second scan lines S2 i−1 and S2 i may extend in the first directionDR1. The second scan lines S2 i−1 and S2 i may include the (i−1)thsecond scan line S2 i−1 and the i-th second scan line S2 i that aresequentially arranged in the second direction DR2 that crosses the firstdirection DR1. The second scan lines S2 i−1 and S2 i may receive scansignals. The i-th second scan line S2 i may be branched into two linesthat may be connected to different transistors. For example, the i-thsecond scan line S2 i may include an upper i-th second scan line S2 ithat is adjacent to the (i−1)th second scan line S2 i−1 and a lower i-thsecond scan line S2 i that is distant from the (i−1)th second scan lineS2 i−1 than the i-th second scan line S2 i.

The emission control line E2 i may extend in the first direction DR1.The emission control line E2 i may be arranged to be spaced apart fromthe i-th second scan line S2 i between the two upper and lower i-thsecond scan lines S2 i. The emission control line E2 i may receive anemission control signal.

The second scan lines S2 i−1 and S2 i and the emission control line E2 imay extend to the second peripheral area PPA2 and/or the additionalperipheral area APA. More specifically, the second scan lines S2 i−1 andS2 i provided in the second pixel area PXA2 may extend to the secondperipheral area PPA2 surrounding the second pixel area PXA2. Inaddition, the emission control line E2 i provided in the second pixelarea PXA2 may extend to the second peripheral area PPA2.

Hereinafter, for convenience of explanation, the second scan lines S2i−1 and S2 i extending from the second pixel area PXA2 to the secondperipheral area PPA2 may be referred to as “second scan line extensionportions S2 i−1′ and S2 i′”. In addition, the emission control line E2 iextending from the second pixel area PXA2 to the second peripheral areaPPA2 may be referred to as an “emission control line extension portionE2 i′”.

The second pixels PXL2−1 and PXL2−2 may include a (2−1)th pixel PXL2−1that is arranged in the i-th second scan line S2 i and the first dataline DL1, and a (2−2)th pixel PXL2−2 that is arranged in the i-th secondscan line S2 i and the second data line DL2. Each of the (2−1)th pixelPXL2−1 and the (2−2)th pixel PXL2−2 may include an organic lightemitting device, the first to seventh transistors T1 to T7, and thestorage capacitor Cst.

The first transistor T1 may include the first gate electrode GE1, thefirst active pattern ACT1, the first source electrode SE1, the firstdrain electrode DE1, and the first connection line CNL1. The secondtransistor T2 may include the second gate electrode GE2, the secondactive pattern ACT2, the second source electrode SE2, and the seconddrain electrode DE2. The third transistor T3 may include the third gateelectrode GE3, the third active pattern ACT3, the third source electrodeSE3, and the third drain electrode DE3. The fourth transistor T4 mayinclude the fourth gate electrode GE4, the fourth active pattern ACT4,the fourth source electrode SE4, and the fourth drain electrode DE4. Thefifth transistor T5 may include the fifth gate electrode GE5, the fifthactive pattern ACT5, the fifth source electrode SE5, and the fifth drainelectrode DE5. The sixth transistor T6 may include the sixth gateelectrode GE6, the sixth active pattern ACT6, the sixth source electrodeSE6, and the sixth drain electrode DE6. The seventh transistor T7 mayinclude the seventh gate electrode GE7, the seventh active pattern ACT7,the seventh source electrode SE7, and the seventh drain electrode DE7.

The substrate SUB may include the second pixel area PXA2 where thesecond pixels PXL2−1 and PXL2−2 are provided and the second peripheralarea PPA2 surrounding the second pixel area PXA2. The dummy part DMP forcompensating for the difference in a load value between the pixel areasPXA may be provided in the second peripheral area PPA2.

The dummy part DMP may include an eighth active pattern ACT8, a secondmetal layer MTL2, and a first metal layer MTL1.

The eighth active pattern ACT8 may be provided on the same layer as thefirst active to seventh active patterns ACT1 to ACT7 that are providedon the second pixels PXL2−1 and PXL2−2. The eighth active pattern ACT8may include a semiconductor layer, and the semiconductor layer may ormay not be doped with impurities. The eighth active pattern ACT8 mayhave a bar shape extending in the second direction DR2 and be arrangedin the first direction DR1. However, the present disclosure is notlimited thereto. As viewed in the plane, the eighth active pattern ACT8may partially overlap with the second metal layer MTL2.

The second metal layer MTL2 may include the second scan line extensionportions S2 i−1′ and S2 i′ extending from the second pixel area PXA2 tothe second peripheral area PPA2 and the emission control line extensionportion E2 i′ extending from the second pixel area PXA2 to the secondperipheral area PPA2. The second metal layer MTL2 may be provided on thesame layer as the second scan lines S2 i−1 and S2 i and the emissioncontrol line E2 i that are provided in the second pixel area PXA2.

The first metal layer MTL1 may overlap with the eighth active patternACT8 and the second metal layer MTL2 while interposing the insulatinglayers GI, IL1, and IL2, and cover a portion or entirety of the secondperipheral area PPA2.

The first metal layer MTL1 may extend from the power supply lines PL1and PL2 that are connected to the second pixels PXL2−1 and PXL2−2 andarranged closest to the dummy part DMP. However, the present disclosureis not limited thereto. For example, as shown in FIG. 1, the first metallayer MTL1 may be formed integrally with the first power supply lineELVDD surrounding the second peripheral area PPA2 and overlapping withthe overlapping dummy part DMP. The first metal layer MTL1 may beelectrically connected to the power supply lines PL1 and PL2 that areconnected to the second pixels PXL2−1 and PXL2−2.

The first metal layer MTL1 may be provided on the same layer as the datalines D1 and D2 and the power supply lines PL1 and PL2. According to oneembodiment, the first metal layer MTL1 may be formed integrally with thepower supply lines PL1 and PL2 so that a fixed voltage applied to eachof the first power supply line PL1 and the second power supply line PL2may also be applied to the first metal layer MTL1. The fixed voltage maybe the first power supplied to the first power supply line ELVDD. Thefirst metal layer MTL1 may overlap with the second metal layer MTL2 toform a parasitic capacitor. In addition, the second metal layer MTL2 mayoverlap with the eighth active pattern ACT8 and the gate insulatinglayer GI, among the insulating layers (GI, IL1, and IL2), therebetweenso as to form a parasitic capacitor.

The first metal layer MTL1 may be connected to the eighth active patternACT8 through an eleventh contact hole CH11. The eleventh contact holeCH11 may be arranged in an overlapping area between the eighth activepattern ACT8 and the first metal layer MTL1. More specifically, theeleventh contact hole CH11 may be arranged in an area where the secondmetal layer MTL2 is not provided, and the eighth active pattern ACT8 andthe first metal layer MTL1 overlap with each other.

The dummy part DMP may include at least one eleventh contact hole CH11.However, the present disclosure is not limited thereto. For example, thedummy part DMP may include the same or less number of eleventh contactholes CH11 as the number of contact holes CH1 to CH10 provided in thesecond pixels PXL2−1 and PXL2−2. The second pixels PXL2−1 and PXL2−2 maybe arranged closest to the dummy part DMP in the second direction DR2 inthe second pixel area PXA2.

By arranging the dummy part DMP and the eleventh contact hole CH11 inthe dummy part DMP, the elements arranged in the second pixels PXL2−1and PXL2−2 arranged closest to the dummy part DMP, for example, lines,active patterns, and contact holes, may have a similar density to thosearranged in the dummy part DMP.

In general, the density of the elements disposed in the dummy part DMPmay be lower than the density of the elements disposed in the secondpixels PXL2−1 and PXL2−2 that are closest to the dummy part DMP. As aresult, a difference in uniformity may occur between the secondperipheral area PPA2 where the dummy part DMP is disposed and the secondpixel area PXA2 where the second pixels PXL2−1 and PXL2−2 that areclosest to the dummy part DMP are disposed.

When the second peripheral area PPA2 and the second pixel area PXA2 havedifferent degrees of uniformity, the second pixels PXL2−1 and PXL2−2 maynot be desirably designed during processes using a mask. As a result,the second pixels PXL2−1 and PXL2−2 that are arranged closest to thedummy part DMP may have a different size from the remaining secondpixels PXL2 that are adjacent to the second pixels PXL2−1 and PXL2−2 inthe second direction DR2. Thus, the second pixels PXL2 may havedifferent sizes depending on their position, a difference in visibilitymay occur, and the uniformity of the second pixel area PXA2 may bedeteriorated.

According to one embodiment, by arranging at least one eleventh contacthole CH11 in the dummy part DMP, the density of the elements in thesecond pixels PXL2−1 and PXL2−2 that are arranged closest to the dummypart DMP may be made to be similar to the density of the elements in thedummy part DMP.

In the dummy part DMP, the second metal layer MTL2 and the first metallayer MTL1 may overlap with each other while interposing the first andsecond interlayer insulating layers IL1 and IL2, among the insulatinglayers GI, IL1, and IL2, thereby forming the parasitic capacitor. Inaddition, in the dummy part DMP, the eighth active pattern ACT8 and thesecond metal layer MTL2 may overlap with each other with the gateinsulating layer GI that is interposed therebetween to form theparasitic capacitor. The parasitic capacitance of the parasiticcapacitor may increase load values of the second scan lines S2 i−1 andS2 i and/or the emission control line E2 i that are provided in thesecond pixel area PXA2. As a result, the load values of the second scanlines S2 i−1 and S2 i may be the same as or similar to load values ofthe first scan lines of the first pixel area PXA1.

According to one embodiment, the parasitic capacitance formed by thedummy part DMP may vary depending on load values of scan lines and/oremission control lines to compensate for a difference.

According to one embodiment, the dummy part DMP and the eleventh contacthole CH11 that is disposed in the dummy part DMP may be provided in thethird peripheral area PPA3 in the same configuration as the secondperipheral area PPA2. Therefore, a description of the third peripheralarea PPA3 will be omitted.

Hereinafter, the structure of the dummy part DMP is described accordingto a stacking order with reference to FIG. 9.

The eighth active pattern ACT8 may be provided on the substrate SUB. Theeighth active pattern ACT8 may include a semiconductor material.

The gate insulating layer GI may be provided on the substrate SUB wherethe eighth active pattern ACT8 is provided.

The second metal layer MTL2 may be provided on the gate insulating layerGI. The second metal layer MTL2 may overlap with the eighth activepattern ACT8 while interposing the gate insulating layer GI to form theparasitic capacitor.

The first interlayer insulating layer IL1 and the second interlayerinsulating layer IL2 may be sequentially provided on the second metallayer MTL2. The eleventh contact hole CH11 may be formed through thesecond interlayer insulating layer IL2, the first interlayer insulatinglayer IL1, and the gate insulating layer GI.

The first metal layer MTL1 may be provided on the second interlayerinsulating layer IL2 including the eleventh contact hole CH11. The firstmetal layer MTL1 may be coupled to the eighth active pattern ACT8through the eleventh contact hole CH11. The first metal layer MTL1 mayoverlap with the second metal layer MTL2 while interposing the first andsecond interlayer insulating layers IL1 and IL2 to form the parasiticcapacitor.

The passivation layer PSV may be provided on the substrate SUB on whichthe first metal layer MTL1 is formed. The pixel defining layer PDL maybe provided on the substrate SUB on which the passivation layer PSV isformed. Each of the passivation layer PSV and the pixel defining layerPDL may be an organic insulating layer including an organic material.

The sealing layer SLM covering the pixel defining layer PDL may beprovided on the pixel defining layer PDL.

FIGS. 10 to 13 are schematic layout views illustrating layers ofelements of a second pixel and a dummy part shown in FIG. 8.

First, referring to FIGS. 8 and 10, the first to eighth active patternsACT1 to ACT8 may be provided on the substrate SUB as shown in FIG. 9.The first to eighth active patterns ACT1 to ACT8 may be provided on thesame layer and formed by the same processes.

One end of the first active pattern ACT1 may be connected to the firstsource electrode SE1 and the other end of the first active pattern ACT1may be connected to the first drain electrode DEL One end of the secondactive pattern ACT2 may be connected to the second source electrode SE2and the other end of the second active pattern ACT2 may be connected tothe second drain electrode DE2. One end of the third active pattern ACT3may be connected to the third source electrode SE3 and the other end ofthe third active pattern ACT3 may be connected to the third drainelectrode DE3. One end of the fourth active pattern ACT4 may beconnected to the fourth source electrode SE4, and the other end of thefourth active pattern ACT4 may be connected to the fourth drainelectrode DE4. One end of the fifth active pattern ACT5 may be connectedto the fifth source electrode SE5, and the other end of the fifth activepattern ACT5 may be connected to the fifth drain electrode DE5. One endof the sixth active pattern ACT6 may be connected to the sixth sourceelectrode SE6, and the other end of the sixth active pattern ACT6 may beconnected to the sixth drain electrode DE6. One end of the seventhactive pattern ACT7 may be connected to the seventh source electrodeSE7, and the other end of the seventh active pattern ACT7 may beconnected to the seventh drain electrode DE7.

Referring to FIGS. 8 and 11, the second scan lines S2 i−1 and S2 i, theemission control line E2 i, the lower electrode LE, and the second metallayer MTL2 may be provided on the first to eighth active patterns ACT1to ACT8 with the gate insulating layer GI being interposed as shown inFIG. 9. The second scan lines S2 i−1 and S2 i, the emission control lineE2 i, the lower electrode LE, and the second metal layer MTL2 may beprovided on the same layer and formed by the same processes.

The second scan lines S2 i−1 and S2 i may include the (i−1)th secondscan line S2 i−1 and the i-th second scan line S2 i. The i-th secondscan line S2 i may be branched into two lines. For example, the i-thsecond scan line S2 i may include a lower i-th second scan line S2 i andan upper i-th second scan line S2 i.

The first gate electrode GE1 may be provided on the lower electrode LE,and the fourth gate electrode GE4 may be provided on the (i−1)th secondscan line S2 i−1. The second gate electrode GE2 and the third gateelectrode GE3 may be provided on the upper i-th second scan line S2 i.The fifth gate electrode GE5 and the sixth gate electrode GE6 may beprovided on the second emission control line E2 i. The seventh gateelectrode GE7 may be provided on the lower i-th second scan line S2 i.

The second metal layer MTL2 may include an (i−1)th second scan lineextension portion S2 i−1′ in which the (i−1)th second scan line S2 i−1extends to the second peripheral area PPA2, an i-th second scan lineextension portion S2 i′ in which the i-th second scan line S2 i extendsto the second peripheral area PPA2, and an i-th emission control lineextension portion E2 i′ in which the second emission control line E2 iextends to the second peripheral area PPA2.

Referring to FIGS. 8 and 12, the initialization power supply line IPLand the upper electrode UE may be provided on the second scan lines S2i−1 and S2 i, the emission control line E2 i, the lower electrode LE,and the second metal layer MTL2 with the first interlayer insulatinglayer IL1 being interposed as shown in FIG. 9. The initialization powersupply line IPL and the upper electrode UE may be provided on the samelayer and formed by the same processes.

Referring to FIGS. 8 and 13, the first and second data lines DL1 andDL2, the power supply lines PL1 and PL2, the auxiliary connection lineAUX, the first connection line CNL1, the bridge pattern BRP, and thefirst metal layer MTL1 may be provided on the initialization powersupply line IPL and the upper electrode UE with the second interlayerinsulating layer IL2 being interposed as shown in FIG. 9.

The first and second data lines DL1 and DL2 may be connected to thesecond source electrode SE2 through the sixth contact hole CH6 that isformed through the second interlayer insulating layer IL2, the firstinterlayer insulating layer IL1, and the gate insulating layer GI.

The power supply lines PL1 and PL2 may be connected to the upperelectrode UE through the third and fourth contact holes CH3 and CH4 thatare formed through the second interlayer insulating layer IL2. Inaddition, the power supply lines PL1 and PL2 may be connected to thefifth source electrode SE5 through the fifth contact hole CH5 that isformed through the second interlayer insulating layer IL2, the firstinterlayer insulating layer IL1, and the gate insulating layer GI.

The first connection line CNL1 may be connected to the first gateelectrode GE1 through the first contact hole CH1 that is formed throughthe second interlayer insulating layer IL2 and the first interlayerinsulating layer ILL In addition, the first connection line CNL1 may beconnected to the third drain electrode DE3 and the fourth drainelectrode DE4 through the second contact hole CH2.

The auxiliary connection line AUX may be connected to the initializationpower supply line IPL through the eighth contact hole CH8 passingthrough the second interlayer insulating layer IL2. In addition, theauxiliary connection line AUX may be connected to the seventh drainelectrode DE7 through the ninth contact hole CH9 passing through thesecond interlayer insulating layer IL2, the first interlayer insulatinglayer IL1, and the gate insulating layer GI.

The bridge pattern BRP may be connected to the sixth drain electrode DE6and the seventh source electrode SE7 through the seventh contact holeCH7 that is formed through the second interlayer insulating layer IL2,the first interlayer insulating layer IL1, and the gate insulating layerGI.

The first metal layer MTL1 may be connected to the eighth active patternACT8 through the eleventh contact hole CH11 that is formed through thesecond interlayer insulating layer IL2, the first interlayer insulatinglayer IL1, and the gate insulating layer GI.

FIG. 14 illustrates a view illustrating portions of a dummy part and asecond pixel area adjacent to the dummy part, according to anotherembodiment. FIG. 14 is a plan view illustrating a portion P1 of FIG. 1.To avoid redundancy, differences from the earlier described embodimentsare mainly described with reference to FIG. 14. Portions that are notparticularly described may comply with the earlier describedembodiments. Like or identical reference numerals refer to like oridentical parts and components.

Referring to FIGS. 1 and 14, a display device may include the substrateSUB, the line part, and the second pixels PXL2−1 and PXL2−2.

The substrate SUB may include the second pixel area PXA2 where thesecond pixels PXL2−1 and PXL2−2 are provided and the second peripheralarea PPA2 surrounding the second pixel area PXA2. The dummy part DMP maybe provided in the second peripheral area PPA2 so as to compensate forthe difference in a load value between the pixel areas PXA.

The second pixels PXL2−1 and PXL2−2 may be disposed closest to the dummypart DMP in the second direction DR2 in the second pixel area PXA2. Eachof the second pixels PXL2−1 and PXL2−2 may include the organic lightemitting device, the first to seventh transistors T1 to T7, and thestorage capacitor Cst.

The line part may include the second scan lines S2 i−1 and S2 i, thefirst and second data lines DL1 and DL2, the emission control line E2 i,the power supply lines PL1 and PL2, and the initialization power supplyline IPL that supply signals to each of the second pixels PXL2−1 andPXL2−2.

The second scan lines S2 i−1 and S2 i may extend in the first directionDR1. The second scan lines S2 i−1 and S2 i may include the (i−1)thsecond scan line S2 i−1 and the i-th second scan line S2 i that aresequentially arranged in the second direction DR2 that crosses the firstdirection DR1.

The emission control line E2 i may extend in the first direction DR1 andreceive an emission control signal.

Hereinafter, the second scan lines S2 i−1 and S2 i and the emissioncontrol line E2 i may extend to the second peripheral area PPA2 and/orthe additional peripheral area APA. More specifically, the second scanlines S2 i−1 and S2 i provided in the second pixel area PXA2 may extendto the second peripheral area PPA2 surrounding the second pixel areaPXA2. In addition, the emission control line E2 i provided in the secondpixel area PXA2 may extend to the second peripheral area PPA2.

The second scan lines S2 i−1 and S2 i extending from the second pixelarea PXA2 to the second peripheral area PPA2 may be the “second scanline extension portions S2 i−1′ and S2 i′” and the emission control lineE2 i extending from the second pixel area PXA2 to the second peripheralarea PPA2 may be the “emission control line extension portion E2 i′”.

The dummy part DMP may include the eighth active pattern ACT8, thesecond metal layer MTL2, and the first metal layer MTL1.

The eighth active pattern ACT8 may be provided on the same layer as thefirst to seventh active patterns ACT1 to ACT7 that are provided in thesecond pixels PXL2−1 and PXL2−2. The eighth active pattern ACT8 may beformed of a semiconductor layer, and the semiconductor layer may or maynot be doped with impurities.

The second metal layer MTL2 may include the second scan line extensionportions S2 i−1′ and S2 i′ and the emission control line extensionportion E2 i′ and be provided on the same layer as the second scan linesS2 i−1 and S2 i and the emission control line E2 i that are provided inthe second pixel area PXA2.

The first metal layer MTL1 may overlap with the eighth active patternACT8 and the second metal layer MTL2 with the insulating layers GI, IL1,and IL2 interposed therebetween and cover a portion or entirety of thesecond peripheral area PPA2. The first metal layer MTL1 may extend fromthe power supply lines PL1 and PL2 connected to the second pixels PXL2−1and PXL2−2 that are disposed closest to the dummy part DMP. The firstmetal layer MTL1 may be provided on the same layer as the first andsecond data lines DL1 and DL2 and the power supply lines PL1 and PL2.According to one embodiment, the first metal layer MTL1 may be formedintegrally with the power supply lines PL1 and PL2, so that a fixedvoltage provided from the power supply lines PL1 and PL2 may also beapplied to the first metal layer MTL1. The first metal layer MTL1 mayoverlap with the second metal layer MTL2 to form a parasitic capacitor.In addition, the second metal layer MTL2 may overlap with the eighthactive pattern ACT8 while interposing the gate insulating layer GI,among the insulating layers GI, IL1, and IL2, to form the parasiticcapacitor.

The first metal layer MTL1 may be connected to the eighth active patternACT8 through the eleventh contact hole CH11. The eleventh contact holeCH11 may be disposed in an area where the second metal layer MTL2 is notprovided, and the eighth active pattern ACT8 and the first metal layerMTL1 overlap with each other.

The dummy part DMP may include at least one eleventh contact hole CH11.However, the present disclosure is not limited thereto. For example, thedummy part DMP may include the same or less number of eleventh contactholes CH11 as the number of contact holes CH1 to CH10 that are providedin the second pixels PXL2−1 and PXL2−2. By arranging the eleventhcontact hole CH11 in the dummy part DMP, the elements disposed in thesecond pixels PXL2−1 and PXL2−2 that are disposed closest to the dummypart DMP, for example, lines, active patterns, and contact holes, mayhave a similar density to the elements disposed in the dummy part DMP.

In addition, the dummy part DMP may further include at least one dummycontact hole CH11′. The dummy contact hole CH11′ may be provided on oneof the insulating layers GI, ILL and IL2 and between the eleventhcontact holes CH11 as viewed in the plane. The dummy contact hole CH11′may be added to make the density of the elements disposed in the dummypart DMP, together with the eleventh contact hole CH11, similar to thedensity of the elements disposed in the second pixels PXL2−1 and PXL2−2.

FIGS. 15 and 16 are plan views illustrating a display device, accordingto another embodiment. To avoid redundancy, differences from the earlierdescribed embodiments are mainly described with reference to FIGS. 15and 16. Portions that are not particularly described in this embodimentmay comply with the display device according to the earlier describedembodiment. Like or identical reference numerals refer to like oridentical components or parts. In addition, for convenience ofexplanation, FIGS. 15 and 16 illustrate only the second and third scanlines S2 and S3 and the second and third emission control lines E2 andE3 from the line part.

Referring to FIGS. 15 and 16, the display device may include thesubstrate SUB, the pixels (PXL1, PXL2, and PXL3; hereinafter, ‘PXL’)provided on the substrate SUB, the driver provided on the substrate SUBto drive the pixels PXL, the first and second power supply lines ELVDDand ELVSS applying power to the pixels, and the line part connecting thepixels PXL and the driver to each other.

The substrate SUB may include a plurality of areas, at least two ofwhich may have different sizes from each other. The substrate SUB mayinclude the first, second, and third areas A1, A2, and A3.

Referring to FIG. 15, each of the first, second, and third areas A1, A2,and A3 may have a substantially rectangular shape. Referring to FIG. 16,a width of at least a corner portion of the first, second, and thirdareas A1, A2, and A3 may decrease away from the boundaries between thesecond and third areas A2 and A3 and the first area A1.

The first, second, and third areas A1, A2, and A3 may include the pixelareas PXA1, PXA2, and PXA3 (hereinafter, ‘PXA’) and the peripheral areasPPA1, PPA2, and PPA3 (hereinafter, ‘PPA’). More specifically, the firstarea A1 may include the first pixel area PXA1 where the first pixel PXL1is provided and the first peripheral area PPA1 surrounding the firstpixel area PXA1. The second area A2 may include the second pixel areaPXA2 where the second pixel PXL2 is provided and the second peripheralarea PPA2 surrounding the second pixel area PXA2. The third area A3 mayinclude the third pixel area PXA3 where the third pixel PXL3 is providedand the third peripheral area PPA3 surrounding the third pixel areaPXA3.

The driver may include the scan drivers SDV1, SDV2, and SDV3(hereinafter, “SDV”) supplying scan signals to the respective pixels PXLalong the scan lines, the emission drivers EDV1, EDV2, and EDV3(hereinafter, “EDV”) supplying emission control signals to therespective pixels PXL along the emission control lines, the data driverDDV supplying data signals to the respective pixels PXL along the datalines, and the timing controller (not illustrated). The timingcontroller may control the scan driver SDV, the emission driver EDV, andthe data driver DDV.

A voltage applied to the first power supply line ELVDD may be higherthan a voltage applied to the second power supply line ELVSS.

According to one embodiment, a parasitic capacitance of the dummy partDMP disposed in the peripheral area PPA corresponding to each pixel areaPXA may be used to compensate for the difference in a load valueaccording to each pixel area PXA, more specifically, to compensate forthe difference in a load value of the scan lines between the first pixelarea PXA1, the second pixel area PXA2, and the third pixel area PXA3.The dummy part DMP may not be provided in the first peripheral areaPPA1, but may be provided in the second peripheral area PPA2 and thethird peripheral area PPA3.

The dummy part DMP may include a first sub-dummy part SDMP1 and a secondsub-dummy part SDMP2. The first sub-dummy part SDMP1 and the secondsub-dummy part SDMP2 may be separated from each other in a distance andconnected to each other by separate connection lines.

FIG. 17 is a plan view illustrating a portion corresponding to P2 ofFIG. 15, and FIG. 18 is a cross-sectional view taken along line IV-IV′.

Referring to FIGS. 15, 17, and 18, the display device may include thedummy part DMP that is disposed in the second peripheral area PPA2 ofthe substrate SUB. The dummy part DMP may include the first sub-dummypart SDMP1 and the second sub-dummy part SDMP2.

Each of the first sub-dummy part SDMP1 and the second sub-dummy partSDMP2 may include the eighth active pattern ACT8 that is provided on thesubstrate SUB and the first metal layer MTL1 that is provided on theeighth active pattern ACT8 with the insulating layers GI, IL1, and IL2interposed therebetween.

The eighth active pattern ACT8 of each of the first and second sub-dummyparts SDMP1 and SDMP2 may be provided on the same layer as the activepattern of the transistor provided in the second pixel PXL2 in thesecond pixel area PXA2. The eighth active pattern ACT8 may include asemiconductor layer doped with impurities. As viewed in the plane, theeighth active pattern ACT8 may partially overlap with the second metallayer MTL2.

The second metal layer MTL2 of the first sub-dummy part SDMP1 mayinclude the second scan line extension portion S2 i′ extending from thesecond pixel area PXA2 to the second peripheral area PPA2. In addition,the second metal layer MTL2 of the first sub-dummy part SDMP1 mayinclude the emission control line extension portion E2 i′ extending fromthe second pixel area PXA2 to the second peripheral area PPA2. Thesecond metal layer MTL2 of the first sub-dummy part SDMP1 may beprovided on the same layer as the second scan lines S2 i and S2 i−1 andthe second emission control line E2 that are provided on the secondpixel area PXA2.

The second metal layer MTL2 of the second sub-dummy part SDMP2 mayinclude the second scan line extension portions S2 i−1″ and S2 i″extending from the second pixel area PXA2 to the second peripheral areaPPA2. In addition, the second metal layer MTL2 of the second sub-dummypart SDMP2 may include the emission control line extension portion E2 i″extending from the second pixel area PXA2 to the second peripheral areaPPA2. The second metal layer MTL2 of the second sub-dummy part SDMP2 maybe provided on the same layer as the second scan lines S2 i and S2 i−1and the second emission control line E2.

The first metal layer MTL1 of each of the first and second sub-dummyparts SDMP1 and SDMP2 may overlap with the eighth active pattern ACT8 asviewed in the plane and cover a portion of the second peripheral areaPPA2. The data line of the first metal layer MTL1 may be provided on thesame layer as the first power supply line ELVDD.

The first metal layer MTL1 may be connected to the eighth active patternACT8 through the eleventh contact hole CH11. The eleventh contact holeCH11 may be disposed in an overlapping area between the eighth activepattern ACT8 and the first metal layer MTL1. More specifically, theeleventh contact hole CH11 may be provided in an area where the secondmetal layer MTL2 is not provided, and the eighth active pattern ACT8 andthe first metal layer MTL1 overlap with each other.

The first sub-dummy part SDMP1 and the second sub-dummy part SDMP2 maybe separated from each other by a distance in the second peripheral areaPPA2. The first sub-dummy part SDMP1 and the second sub-dummy part SDMP2may be connected to each other by the second connection lines CNL2.

The second connection lines CNL2 may have a bar shape extending in alength direction as viewed in the plane. However, the present disclosureis not limited thereto. In addition, as viewed in the plane, one end ofthe second connection lines CNL2 may overlap with one side of the firstsub-dummy part SDMP1 and the other end facing one of the secondconnection lines CNL2 may overlap with one side of the second sub-dummypart SDMP2. The second connection lines CNL2 may be connected to oneside of the first sub-dummy part SDMP1 and one side of the secondsub-dummy part SDMP2 through a twelfth contact hole CH12 passing throughthe second interlayer insulating layer IL2, among the insulating layersGI, IL1, and IL2. As a result, the first sub-dummy part SDMP1 and thesecond sub-dummy part SDMP2 may be connected to each other by the secondconnection lines CNL2.

The structure of the second sub-dummy part SDMP2 and the secondconnection lines CNL2 is described below according to a stackingstructure with reference to FIG. 17.

The gate insulating layer GI and the first interlayer insulating layerIL1 may be sequentially formed on the substrate SUB. The secondconnection lines CNL2 may be formed on the first interlayer insulatinglayer ILL The second connection lines CNL2 may be provided on the samelayer as the upper electrode UE of the storage capacitor that isprovided in the second pixel PXL2 as shown in FIG. 8.

The second interlayer insulating layer IL2 may be formed on the secondconnection lines CNL2. The twelfth contact hole CH12 may be formedthrough the second interlayer insulating layer IL2 to expose a portionof the second connection lines CNL2.

The first metal layer MTL1 may be provided on the second interlayerinsulating layer IL2 including the twelfth contact hole CH12.

The passivation layer PSV and the pixel defining layer PDL may besequentially formed on the substrate SUB where the first metal layerMTL1 is formed. Each of the passivation layer PSV and the pixel defininglayer PDL may be an organic insulating layer including an organicmaterial. As the organic material, polyacrylic compounds, polyimidecompounds, fluorocarbon compounds such as Teflon, and benzocyclobutenecompounds may be used.

The sealing layer SLM covering the pixel defining layer PDL may beprovided on the pixel defining layer PDL. The sealing layer SLM maycover the pixel area PXA of the substrate SUB and extend outward beyondthe pixel area PXA. The sealing layer SLM may be an inorganic insulatinglayer including an inorganic material.

The insulating layers PSV and PDL including the organic material may beadvantageous in terms of flexibility and elasticity but may be moresubject to ingress of moisture or oxygen as compared with insulatinglayers including an inorganic material. According to one embodiment, endportions of the insulating layers PSV and PDL including the organicmaterial may be covered by the insulating layers including the inorganicmaterial. For example, the passivation layer PSV and the pixel defininglayer PDL including the organic material may extend to a portion of theperipheral area PPA of the substrate SUB but may not cover the entireperipheral area PPA. The passivation layer PSV and the pixel defininglayer PDL may have a valley VL formed by removing a portion thereofalong the circumference of the pixel area PXA. According to oneembodiment, the top surface of the pixel defining layer PDL and thesecond interlayer insulating layer IL2 that are exposed by the valley VLmay be sealed by the sealing layer SLM including the inorganic materialto prevent ingress of moisture or oxygen.

According to one embodiment, the second connection lines CNL2 may bedisposed in the second peripheral area PPA2 of the substrate SUB so asto overlap with the valley VL. In other words, the second connectionlines CNL2 may correspond to the valley VL.

A display device according to one embodiment may be used in variouselectronic devices. For example, the display device may be applicable totelevisions, notebooks, smartphones, smartpads, portable media players(PMPs), person digital assistances (PDAs), navigations, or various typesof wearable devices, such as smartwatches.

The above-described display device may have at least two areas havingdifferent sizes from each other, and each of the areas may have uniformbrightness.

Although example embodiments are disclosed herein, these embodimentsshould not be construed to limit a scope of the present disclosure.Those of ordinary skill in the art would recognize that various changesin form and details may be made without departing from the spirit andscope of the present disclosure.

What is claimed is:
 1. A display device comprising: a substrateincluding a first area, a second area extended from a first portion ofthe first area, a third area separated from the second area and extendedfrom a second portion of the first area, and a peripheral areasurrounding the first area, the second area, and the third area; and aplurality of pixels provided in each of the first area, the second area,and the third area, wherein at least a corner portion of each of thefirst area, the second area, and the third area has a width decreasingaway from a boundary between one of the second area and the third area,and the first area.
 2. The display device of claim 1, wherein: each ofthe second area and the third area has a smaller area than the firstarea, and an outer corner portion of each of the second area and thethird area has an oblique corner.
 3. The display device of claim 2,further comprising: a first line connected to the plurality of pixelsprovided in the first area; a second line connected to the plurality ofpixels provided in the second area; and a third line connected to theplurality of pixels provided in the third area.
 4. The display device ofclaim 3, further comprising: a dummy part disposed in the peripheralarea; and a power line overlapping and extending through the first area,the second area, and the third area and connected to the dummy part. 5.The display device of claim 4, wherein the dummy part overlaps at leastone of the second line and the third line and forms a parasiticcapacitance that compensates for a difference in a load value among thefirst line, the second line, and the third line.
 6. The display deviceof claim 5, wherein the dummy part includes: an active pattern disposedon the substrate; an insulating layer disposed on the active pattern andincluding a contact hole; a first metal layer disposed on the insulatinglayer; and a second metal layer disposed between the active pattern andthe first metal layer, wherein the active pattern and the first metallayer are connected through the contact hole.
 7. The display device ofclaim 6, wherein: the contact hole is provided in an overlapping areabetween the active pattern and the first metal layer, and the firstmetal layer is connected to a power supply line.
 8. The display deviceof claim 6, wherein the first metal layer extends from the power lineconnected to pixels closest to the dummy part among the plurality ofpixels to the peripheral area.
 9. The display device of claim 7,wherein: the first line is a first scan line extending in a firstdirection on substrate and supplying a first scan signal to theplurality of pixels provided in the first area, the second line is asecond scan line extending in the first direction and supplying a secondscan signal to the plurality of pixels provided in the second area, andthe third line is a third scan line extending in the first direction andsupplying a third scan signal to the plurality of pixels provided in thethird area, wherein the second metal layer is provided in a same layeras the first scan line, the second scan line, and the third scan line.10. The display device of claim 9, wherein a first length of the firstscan line is greater than each of a second length of the second scanline and a third length of the third scan line.
 11. The display deviceof claim 10, wherein at least one of the second scan line and the thirdscan line extends to a portion of the peripheral area and overlaps thedummy part.
 12. The display device of claim 11, wherein: the dummy partincludes at least two sub-dummy parts separated from each other by adistance, and the at least two sub-dummy parts are connected to eachother by a coupling pattern.
 13. The display device of claim 12,wherein: the coupling pattern is provided between the second metal layerand the first metal layer, and the coupling pattern extends from one ofthe two sub-dummy parts to the other sub-dummy part in a plan view. 14.The display device of claim 13, further comprising: a passivation layerdisposed on the first metal layer; a pixel defining layer disposed onthe passivation layer; and a sealing layer covering portions of thefirst area, the second area, the third area, and a portion of theperipheral area and including an inorganic material, wherein thepassivation layer and the pixel defining layer have a valley formed byremoving portions of the passivation layer and the pixel defining layeralong a circumference of each of the first area, the second area, andthe third area.
 15. The display device of claim 14, wherein: the valleyis formed at a position corresponding to the coupling pattern, and thesealing layer covers side surfaces of the passivation layer and thepixel defining layer.
 16. The display device of claim 6, wherein theinsulating layer of the dummy part further comprises a dummy contacthole that is different from the contact hole.
 17. The display device ofclaim 16, wherein a first density of elements disposed in the dummy partis similar to a second density of elements disposed in a pixel that isdisposed closest to the dummy part in at least one of the second areaand the third area.